X-ray reflectivity, photoelectron and nanoindentation studies of tetrahedral amorphous carbon (ta-C) films synthesized by double bend cathodic arc

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Abstract

Tetrahedral amorphous carbon (ta-C) films have been prepared with floating potential (no substrate bias voltage) on Si substrates by an off-plane double bend filtered vacuum cathodic arc (FCVA) system. The influences of arc current on mass density, chemical bonding and nanomechanical response have been studied for coatings. Based on X-ray reflectivity spectra, the maximum density of FCVA films is 3.27 g/cm(3). The hardness measurements performed as a function of indentation depth for 75-nm-thick films have a maximum hardness of 37.5 GPa and stress values up to 13 GPa. The sp(3) content in the ta-C films as determined by analysis of the C 1s core level spectra had a value of approximately 80% with standard deviation value 1.2% on 6-cm diameter Si waver. Therefore, these coatings have both structural and thickness uniformity, which can be used for large area coating applications (i.e. flat panel display units). (C) 2003 Elsevier B.V. All rights reserved.
LanguageEnglish
Pages1486-1490
JournalDiamond and Related Materials
Volume13
Issue number4-8
DOIs
Publication statusPublished - Apr 2004

Fingerprint

Carbon films
Amorphous carbon
Amorphous films
Nanoindentation
Photoelectrons
X rays
Coatings
Hardness
Flat panel displays
Core levels
Substrates
Bias voltage
Indentation
Thick films
Vacuum

Keywords

  • ta-C
  • cathodic arc discharge
  • surface characterization
  • hardness

Cite this

@article{d03fa9b574384616b53aac4f9aea73ba,
title = "X-ray reflectivity, photoelectron and nanoindentation studies of tetrahedral amorphous carbon (ta-C) films synthesized by double bend cathodic arc",
abstract = "Tetrahedral amorphous carbon (ta-C) films have been prepared with floating potential (no substrate bias voltage) on Si substrates by an off-plane double bend filtered vacuum cathodic arc (FCVA) system. The influences of arc current on mass density, chemical bonding and nanomechanical response have been studied for coatings. Based on X-ray reflectivity spectra, the maximum density of FCVA films is 3.27 g/cm(3). The hardness measurements performed as a function of indentation depth for 75-nm-thick films have a maximum hardness of 37.5 GPa and stress values up to 13 GPa. The sp(3) content in the ta-C films as determined by analysis of the C 1s core level spectra had a value of approximately 80{\%} with standard deviation value 1.2{\%} on 6-cm diameter Si waver. Therefore, these coatings have both structural and thickness uniformity, which can be used for large area coating applications (i.e. flat panel display units). (C) 2003 Elsevier B.V. All rights reserved.",
keywords = "ta-C, cathodic arc discharge, surface characterization, hardness",
author = "GA Abbas and P Papakonstantinou and JAD McLaughlin",
note = "14th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide, Salzburg, AUSTRIA, SEP 08-12, 2003",
year = "2004",
month = "4",
doi = "10.1016/j.diamond.2003.11.087",
language = "English",
volume = "13",
pages = "1486--1490",
journal = "Diamond and Related Materials",
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TY - JOUR

T1 - X-ray reflectivity, photoelectron and nanoindentation studies of tetrahedral amorphous carbon (ta-C) films synthesized by double bend cathodic arc

AU - Abbas, GA

AU - Papakonstantinou, P

AU - McLaughlin, JAD

N1 - 14th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide, Salzburg, AUSTRIA, SEP 08-12, 2003

PY - 2004/4

Y1 - 2004/4

N2 - Tetrahedral amorphous carbon (ta-C) films have been prepared with floating potential (no substrate bias voltage) on Si substrates by an off-plane double bend filtered vacuum cathodic arc (FCVA) system. The influences of arc current on mass density, chemical bonding and nanomechanical response have been studied for coatings. Based on X-ray reflectivity spectra, the maximum density of FCVA films is 3.27 g/cm(3). The hardness measurements performed as a function of indentation depth for 75-nm-thick films have a maximum hardness of 37.5 GPa and stress values up to 13 GPa. The sp(3) content in the ta-C films as determined by analysis of the C 1s core level spectra had a value of approximately 80% with standard deviation value 1.2% on 6-cm diameter Si waver. Therefore, these coatings have both structural and thickness uniformity, which can be used for large area coating applications (i.e. flat panel display units). (C) 2003 Elsevier B.V. All rights reserved.

AB - Tetrahedral amorphous carbon (ta-C) films have been prepared with floating potential (no substrate bias voltage) on Si substrates by an off-plane double bend filtered vacuum cathodic arc (FCVA) system. The influences of arc current on mass density, chemical bonding and nanomechanical response have been studied for coatings. Based on X-ray reflectivity spectra, the maximum density of FCVA films is 3.27 g/cm(3). The hardness measurements performed as a function of indentation depth for 75-nm-thick films have a maximum hardness of 37.5 GPa and stress values up to 13 GPa. The sp(3) content in the ta-C films as determined by analysis of the C 1s core level spectra had a value of approximately 80% with standard deviation value 1.2% on 6-cm diameter Si waver. Therefore, these coatings have both structural and thickness uniformity, which can be used for large area coating applications (i.e. flat panel display units). (C) 2003 Elsevier B.V. All rights reserved.

KW - ta-C

KW - cathodic arc discharge

KW - surface characterization

KW - hardness

U2 - 10.1016/j.diamond.2003.11.087

DO - 10.1016/j.diamond.2003.11.087

M3 - Article

VL - 13

SP - 1486

EP - 1490

JO - Diamond and Related Materials

T2 - Diamond and Related Materials

JF - Diamond and Related Materials

SN - 0925-9635

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ER -