Ultra-thin film deposition and characterisation of 10nm amorphous carbon layers for applications in magnetic storage devices

JAD McLaughlin, PMA Ogwu, R Lamberton, JF Zhao, P Lemoine

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

This paper will present an overview of our latest results using various ultra-thin film amorphous carbon deposition techniques, and focus on first to grow studies, nano-characterisation of the electrical, mechanical and barrier properties associated with films grown on various substrate types applied to the magnetic recording industry. Although some of the characterisation is carried out on 10nm coatings, the nanomechanical measurements are performed on samples with thickness values between 30nm to 200nm. This overview of our work deals with PECVD deposition techniques and examines ultra-thin film growth on Si and Al2O3: TiC substrates. Some results are presented on the functional benefits of doping a-C:H films with Silicon and Nitrogen. All the work is related to the ability to produce effective 3nm to 10nm overcoat layers for new magnetic recording applications.
LanguageEnglish
Pages167-180
JournalInternational Journal of Modern Physics B
Volume14
Issue number2-3
Publication statusPublished - Jan 2000

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magnetic storage
magnetic recording
carbon
thin films
industries
electrical properties
mechanical properties
coatings
nitrogen
silicon

Cite this

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title = "Ultra-thin film deposition and characterisation of 10nm amorphous carbon layers for applications in magnetic storage devices",
abstract = "This paper will present an overview of our latest results using various ultra-thin film amorphous carbon deposition techniques, and focus on first to grow studies, nano-characterisation of the electrical, mechanical and barrier properties associated with films grown on various substrate types applied to the magnetic recording industry. Although some of the characterisation is carried out on 10nm coatings, the nanomechanical measurements are performed on samples with thickness values between 30nm to 200nm. This overview of our work deals with PECVD deposition techniques and examines ultra-thin film growth on Si and Al2O3: TiC substrates. Some results are presented on the functional benefits of doping a-C:H films with Silicon and Nitrogen. All the work is related to the ability to produce effective 3nm to 10nm overcoat layers for new magnetic recording applications.",
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Ultra-thin film deposition and characterisation of 10nm amorphous carbon layers for applications in magnetic storage devices. / McLaughlin, JAD; Ogwu, PMA; Lamberton, R; Zhao, JF; Lemoine, P.

In: International Journal of Modern Physics B, Vol. 14, No. 2-3, 01.2000, p. 167-180.

Research output: Contribution to journalArticle

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AU - Ogwu, PMA

AU - Lamberton, R

AU - Zhao, JF

AU - Lemoine, P

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