Thickness dependent electronic structure of ultra-thin tetrahedral amorphous carbon (ta-C) films

N Soin, SS Roy, SC Ray, P Lemoine, MDA Rahman, PD Maguire, SK Mitra, JAD McLaughlin

Research output: Contribution to journalArticle

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Abstract

Microstructural properties of ultrathin (1-10 nm) tetrahedral amorphous carbon (ta-C) films are investigated by Near Edge X-ray Absorption Fine Structure (NEXAFS) spectroscopy, X-ray Photoelectron Spectroscopy, Raman spectroscopy and Atomic Force Microscopy (AFM). The CK-edge NEXAFS spectra of 1 nm ta-C films provided evidence of surface defects (C - H bonds) which rapidly diminish with increasing film thickness. A critical thickness for stabilization of largely sp 3 matrix structure distorted by sp 2 sites is observed via the change of ?*C*C peak behavior. Meanwhile, an increase in the film thickness promotes an enhancement in sp 3 content, the film roughness remains nearly constant as probed by spectroscopic techniques and AFM, respectively. The effect of thickness on local bonding states of ultrathin ta-C films proves to be the limiting factor for their potential use in magnetic and optical storage devices. © 2011 Elsevier B.V. All rights reserved.
LanguageEnglish
Pages2909
JournalThin Solid Films
Volume520
Issue number7
DOIs
Publication statusPublished - 2012

Fingerprint

Carbon films
Amorphous carbon
Amorphous films
Electronic structure
electronic structure
Film thickness
carbon
Atomic force microscopy
X ray absorption near edge structure spectroscopy
film thickness
fine structure
Surface defects
X ray absorption
atomic force microscopy
magnetic storage
x rays
Raman spectroscopy
surface defects
X ray photoelectron spectroscopy
Stabilization

Cite this

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title = "Thickness dependent electronic structure of ultra-thin tetrahedral amorphous carbon (ta-C) films",
abstract = "Microstructural properties of ultrathin (1-10 nm) tetrahedral amorphous carbon (ta-C) films are investigated by Near Edge X-ray Absorption Fine Structure (NEXAFS) spectroscopy, X-ray Photoelectron Spectroscopy, Raman spectroscopy and Atomic Force Microscopy (AFM). The CK-edge NEXAFS spectra of 1 nm ta-C films provided evidence of surface defects (C - H bonds) which rapidly diminish with increasing film thickness. A critical thickness for stabilization of largely sp 3 matrix structure distorted by sp 2 sites is observed via the change of ?*C*C peak behavior. Meanwhile, an increase in the film thickness promotes an enhancement in sp 3 content, the film roughness remains nearly constant as probed by spectroscopic techniques and AFM, respectively. The effect of thickness on local bonding states of ultrathin ta-C films proves to be the limiting factor for their potential use in magnetic and optical storage devices. {\circledC} 2011 Elsevier B.V. All rights reserved.",
author = "N Soin and SS Roy and SC Ray and P Lemoine and MDA Rahman and PD Maguire and SK Mitra and JAD McLaughlin",
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Thickness dependent electronic structure of ultra-thin tetrahedral amorphous carbon (ta-C) films. / Soin, N; Roy, SS; Ray, SC; Lemoine, P; Rahman, MDA; Maguire, PD; Mitra, SK; McLaughlin, JAD.

Vol. 520, No. 7, 2012, p. 2909.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Thickness dependent electronic structure of ultra-thin tetrahedral amorphous carbon (ta-C) films

AU - Soin, N

AU - Roy, SS

AU - Ray, SC

AU - Lemoine, P

AU - Rahman, MDA

AU - Maguire, PD

AU - Mitra, SK

AU - McLaughlin, JAD

PY - 2012

Y1 - 2012

N2 - Microstructural properties of ultrathin (1-10 nm) tetrahedral amorphous carbon (ta-C) films are investigated by Near Edge X-ray Absorption Fine Structure (NEXAFS) spectroscopy, X-ray Photoelectron Spectroscopy, Raman spectroscopy and Atomic Force Microscopy (AFM). The CK-edge NEXAFS spectra of 1 nm ta-C films provided evidence of surface defects (C - H bonds) which rapidly diminish with increasing film thickness. A critical thickness for stabilization of largely sp 3 matrix structure distorted by sp 2 sites is observed via the change of ?*C*C peak behavior. Meanwhile, an increase in the film thickness promotes an enhancement in sp 3 content, the film roughness remains nearly constant as probed by spectroscopic techniques and AFM, respectively. The effect of thickness on local bonding states of ultrathin ta-C films proves to be the limiting factor for their potential use in magnetic and optical storage devices. © 2011 Elsevier B.V. All rights reserved.

AB - Microstructural properties of ultrathin (1-10 nm) tetrahedral amorphous carbon (ta-C) films are investigated by Near Edge X-ray Absorption Fine Structure (NEXAFS) spectroscopy, X-ray Photoelectron Spectroscopy, Raman spectroscopy and Atomic Force Microscopy (AFM). The CK-edge NEXAFS spectra of 1 nm ta-C films provided evidence of surface defects (C - H bonds) which rapidly diminish with increasing film thickness. A critical thickness for stabilization of largely sp 3 matrix structure distorted by sp 2 sites is observed via the change of ?*C*C peak behavior. Meanwhile, an increase in the film thickness promotes an enhancement in sp 3 content, the film roughness remains nearly constant as probed by spectroscopic techniques and AFM, respectively. The effect of thickness on local bonding states of ultrathin ta-C films proves to be the limiting factor for their potential use in magnetic and optical storage devices. © 2011 Elsevier B.V. All rights reserved.

U2 - 10.1016/j.tsf.2011.12.039

DO - 10.1016/j.tsf.2011.12.039

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VL - 520

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