The structure of amorphous carbon nitride films using a combined study of NEXAFS, XPS and Raman spectroscopies

Research output: Contribution to journalArticle

35 Citations (Scopus)

Abstract

The nature of bonding in tetrahedral amorphous carbon nitride (ta-C:N) films deposited by filtered cathodic vacuum arc (FCVA) technique was studied with near edge X-ray absorption fine structure (NEXAFS), X-ray photoelectron and Raman spectroscopies. The interpretation and interrelation of these spectra are discussed. The changes in the local structure were systematically studied as a function of nitrogen content. Deconvolution of the C 1s and N 1s XPS spectra shows that the sp(3)-C fraction decreases with an increase in nitrogen content. The pi* peak at the C K (carbon K) and at the N K (nitrogen K) edges were systematically studied. Comparison of intensities of the pi* peak confirms the formation of CN bond at the expense of CC bond. Analysis of NEXAFS spectra at N K edge revealed as the nitrogen concentration in the films increases, the pi*/sigma* intensity ratio increases,indicating that there is an increase of the amount of C=N bond relative to the C-N bonds. Raman parameters, such as G peak width, I-D/I-G ratio, skewness of the G line (Q), were critically analysed in terms of N content and sp(2) content of the films. We demonstrate that the combined study of normalised Raman, XPS and NEXAFS spectra is very useful in determining the role of nitrogen incorporation in the structure of ta-C films. The hardness values, measured by nanoindentation technique reduced at higher (> 7 at.%) N content films. (c) 2004 Elsevier B.V. All rights reserved.
LanguageEnglish
Pages145-150
JournalThin Solid Films
Volume482
Issue number1-2
DOIs
Publication statusPublished - Jun 2005

Fingerprint

carbon nitrides
Carbon nitride
Amorphous carbon
X ray absorption
Raman spectroscopy
Nitrogen
X ray photoelectron spectroscopy
fine structure
nitrogen
spectroscopy
x rays
skewness
Deconvolution
Nanoindentation
nanoindentation
Carbon
hardness
arcs
Hardness
cyanogen

Keywords

  • carbon nitride
  • thin film
  • cathodic arc
  • X-ray spectroscopy

Cite this

@article{8bbb3c1d8ac743d4a3f4345efb285276,
title = "The structure of amorphous carbon nitride films using a combined study of NEXAFS, XPS and Raman spectroscopies",
abstract = "The nature of bonding in tetrahedral amorphous carbon nitride (ta-C:N) films deposited by filtered cathodic vacuum arc (FCVA) technique was studied with near edge X-ray absorption fine structure (NEXAFS), X-ray photoelectron and Raman spectroscopies. The interpretation and interrelation of these spectra are discussed. The changes in the local structure were systematically studied as a function of nitrogen content. Deconvolution of the C 1s and N 1s XPS spectra shows that the sp(3)-C fraction decreases with an increase in nitrogen content. The pi* peak at the C K (carbon K) and at the N K (nitrogen K) edges were systematically studied. Comparison of intensities of the pi* peak confirms the formation of CN bond at the expense of CC bond. Analysis of NEXAFS spectra at N K edge revealed as the nitrogen concentration in the films increases, the pi*/sigma* intensity ratio increases,indicating that there is an increase of the amount of C=N bond relative to the C-N bonds. Raman parameters, such as G peak width, I-D/I-G ratio, skewness of the G line (Q), were critically analysed in terms of N content and sp(2) content of the films. We demonstrate that the combined study of normalised Raman, XPS and NEXAFS spectra is very useful in determining the role of nitrogen incorporation in the structure of ta-C films. The hardness values, measured by nanoindentation technique reduced at higher (> 7 at.{\%}) N content films. (c) 2004 Elsevier B.V. All rights reserved.",
keywords = "carbon nitride, thin film, cathodic arc, X-ray spectroscopy",
author = "SS Roy and R McCann and P Papakonstantinou and PD Maguire and JAD McLaughlin",
note = "Symposium on Synthesis, Characterisation and Advanced Application of Amorphous Carbon Films, Strasbourg, FRANCE, MAY 24-28, 2004",
year = "2005",
month = "6",
doi = "10.1016/j.tsf.2004.11.174",
language = "English",
volume = "482",
pages = "145--150",
number = "1-2",

}

The structure of amorphous carbon nitride films using a combined study of NEXAFS, XPS and Raman spectroscopies. / Roy, SS; McCann, R; Papakonstantinou, P; Maguire, PD; McLaughlin, JAD.

Vol. 482, No. 1-2, 06.2005, p. 145-150.

Research output: Contribution to journalArticle

TY - JOUR

T1 - The structure of amorphous carbon nitride films using a combined study of NEXAFS, XPS and Raman spectroscopies

AU - Roy, SS

AU - McCann, R

AU - Papakonstantinou, P

AU - Maguire, PD

AU - McLaughlin, JAD

N1 - Symposium on Synthesis, Characterisation and Advanced Application of Amorphous Carbon Films, Strasbourg, FRANCE, MAY 24-28, 2004

PY - 2005/6

Y1 - 2005/6

N2 - The nature of bonding in tetrahedral amorphous carbon nitride (ta-C:N) films deposited by filtered cathodic vacuum arc (FCVA) technique was studied with near edge X-ray absorption fine structure (NEXAFS), X-ray photoelectron and Raman spectroscopies. The interpretation and interrelation of these spectra are discussed. The changes in the local structure were systematically studied as a function of nitrogen content. Deconvolution of the C 1s and N 1s XPS spectra shows that the sp(3)-C fraction decreases with an increase in nitrogen content. The pi* peak at the C K (carbon K) and at the N K (nitrogen K) edges were systematically studied. Comparison of intensities of the pi* peak confirms the formation of CN bond at the expense of CC bond. Analysis of NEXAFS spectra at N K edge revealed as the nitrogen concentration in the films increases, the pi*/sigma* intensity ratio increases,indicating that there is an increase of the amount of C=N bond relative to the C-N bonds. Raman parameters, such as G peak width, I-D/I-G ratio, skewness of the G line (Q), were critically analysed in terms of N content and sp(2) content of the films. We demonstrate that the combined study of normalised Raman, XPS and NEXAFS spectra is very useful in determining the role of nitrogen incorporation in the structure of ta-C films. The hardness values, measured by nanoindentation technique reduced at higher (> 7 at.%) N content films. (c) 2004 Elsevier B.V. All rights reserved.

AB - The nature of bonding in tetrahedral amorphous carbon nitride (ta-C:N) films deposited by filtered cathodic vacuum arc (FCVA) technique was studied with near edge X-ray absorption fine structure (NEXAFS), X-ray photoelectron and Raman spectroscopies. The interpretation and interrelation of these spectra are discussed. The changes in the local structure were systematically studied as a function of nitrogen content. Deconvolution of the C 1s and N 1s XPS spectra shows that the sp(3)-C fraction decreases with an increase in nitrogen content. The pi* peak at the C K (carbon K) and at the N K (nitrogen K) edges were systematically studied. Comparison of intensities of the pi* peak confirms the formation of CN bond at the expense of CC bond. Analysis of NEXAFS spectra at N K edge revealed as the nitrogen concentration in the films increases, the pi*/sigma* intensity ratio increases,indicating that there is an increase of the amount of C=N bond relative to the C-N bonds. Raman parameters, such as G peak width, I-D/I-G ratio, skewness of the G line (Q), were critically analysed in terms of N content and sp(2) content of the films. We demonstrate that the combined study of normalised Raman, XPS and NEXAFS spectra is very useful in determining the role of nitrogen incorporation in the structure of ta-C films. The hardness values, measured by nanoindentation technique reduced at higher (> 7 at.%) N content films. (c) 2004 Elsevier B.V. All rights reserved.

KW - carbon nitride

KW - thin film

KW - cathodic arc

KW - X-ray spectroscopy

U2 - 10.1016/j.tsf.2004.11.174

DO - 10.1016/j.tsf.2004.11.174

M3 - Article

VL - 482

SP - 145

EP - 150

IS - 1-2

ER -