The role of non-equilibrium plasmas and micro-discharges in top down nanotechnologies and selforganized assembly of nanostructures

Z Lj Petrovic, G Malovic, M Radmilovic-Radjenovic, N Puac, D Maric, PD Maguire, CMO Mahony

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

We have reviwed the role of plasma technologies in future development of nanoelectronics and in the development of other nanotechnologies. First we address the problems in application of the standard plasma etching procedure. We proceed to discuss the development of damage free plasma processes, in particular the etching by fast neutral beams. Fast neutral beams have a potential for implementation beyond the standard application in production of Integrated Circuits (lcs). In the second half of the paper we discuss some of the applications of micro discharges. The de Volte Ampere characteristics should be analyzed in order to reveal the predominant physical processes by studying E/N, pd and jd(2) scaling. We will also give some results related to rf microdischarge operatting at atmospheric pressure also known as plasma needle. It gives rise to new possibilities for medical treatments (including surgery) with minimum tissue damage. Finally we briefly describe other emerging applications of plasmas in nanotechnologies.
LanguageEnglish
Title of host publicationUnknown Host Publication
Place of Publication345 E 47TH ST, NEW YORK, NY 10017 USA
Pages39-46
Number of pages7
Publication statusPublished - 2006
Event25th International Conference on Microelectronics, Vols 1 and 2, Proceedings - Belgrade, Serbia
Duration: 1 Jan 2006 → …

Conference

Conference25th International Conference on Microelectronics, Vols 1 and 2, Proceedings
Period1/01/06 → …

Fingerprint

nonequilibrium plasmas
nanotechnology
assembly
neutral beams
damage
plasma etching
surgery
needles
integrated circuits
emerging
atmospheric pressure
etching
scaling

Cite this

Petrovic, Z. L., Malovic, G., Radmilovic-Radjenovic, M., Puac, N., Maric, D., Maguire, PD., & Mahony, CMO. (2006). The role of non-equilibrium plasmas and micro-discharges in top down nanotechnologies and selforganized assembly of nanostructures. In Unknown Host Publication (pp. 39-46). 345 E 47TH ST, NEW YORK, NY 10017 USA.
Petrovic, Z Lj ; Malovic, G ; Radmilovic-Radjenovic, M ; Puac, N ; Maric, D ; Maguire, PD ; Mahony, CMO. / The role of non-equilibrium plasmas and micro-discharges in top down nanotechnologies and selforganized assembly of nanostructures. Unknown Host Publication. 345 E 47TH ST, NEW YORK, NY 10017 USA, 2006. pp. 39-46
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title = "The role of non-equilibrium plasmas and micro-discharges in top down nanotechnologies and selforganized assembly of nanostructures",
abstract = "We have reviwed the role of plasma technologies in future development of nanoelectronics and in the development of other nanotechnologies. First we address the problems in application of the standard plasma etching procedure. We proceed to discuss the development of damage free plasma processes, in particular the etching by fast neutral beams. Fast neutral beams have a potential for implementation beyond the standard application in production of Integrated Circuits (lcs). In the second half of the paper we discuss some of the applications of micro discharges. The de Volte Ampere characteristics should be analyzed in order to reveal the predominant physical processes by studying E/N, pd and jd(2) scaling. We will also give some results related to rf microdischarge operatting at atmospheric pressure also known as plasma needle. It gives rise to new possibilities for medical treatments (including surgery) with minimum tissue damage. Finally we briefly describe other emerging applications of plasmas in nanotechnologies.",
author = "Petrovic, {Z Lj} and G Malovic and M Radmilovic-Radjenovic and N Puac and D Maric and PD Maguire and CMO Mahony",
note = "25th International Conference on Microelectronics, Belgrade, SERBIA MONTENEG, MAY 14-17, 2006",
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Petrovic, ZL, Malovic, G, Radmilovic-Radjenovic, M, Puac, N, Maric, D, Maguire, PD & Mahony, CMO 2006, The role of non-equilibrium plasmas and micro-discharges in top down nanotechnologies and selforganized assembly of nanostructures. in Unknown Host Publication. 345 E 47TH ST, NEW YORK, NY 10017 USA, pp. 39-46, 25th International Conference on Microelectronics, Vols 1 and 2, Proceedings, 1/01/06.

The role of non-equilibrium plasmas and micro-discharges in top down nanotechnologies and selforganized assembly of nanostructures. / Petrovic, Z Lj; Malovic, G; Radmilovic-Radjenovic, M; Puac, N; Maric, D; Maguire, PD; Mahony, CMO.

Unknown Host Publication. 345 E 47TH ST, NEW YORK, NY 10017 USA, 2006. p. 39-46.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - The role of non-equilibrium plasmas and micro-discharges in top down nanotechnologies and selforganized assembly of nanostructures

AU - Petrovic, Z Lj

AU - Malovic, G

AU - Radmilovic-Radjenovic, M

AU - Puac, N

AU - Maric, D

AU - Maguire, PD

AU - Mahony, CMO

N1 - 25th International Conference on Microelectronics, Belgrade, SERBIA MONTENEG, MAY 14-17, 2006

PY - 2006

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N2 - We have reviwed the role of plasma technologies in future development of nanoelectronics and in the development of other nanotechnologies. First we address the problems in application of the standard plasma etching procedure. We proceed to discuss the development of damage free plasma processes, in particular the etching by fast neutral beams. Fast neutral beams have a potential for implementation beyond the standard application in production of Integrated Circuits (lcs). In the second half of the paper we discuss some of the applications of micro discharges. The de Volte Ampere characteristics should be analyzed in order to reveal the predominant physical processes by studying E/N, pd and jd(2) scaling. We will also give some results related to rf microdischarge operatting at atmospheric pressure also known as plasma needle. It gives rise to new possibilities for medical treatments (including surgery) with minimum tissue damage. Finally we briefly describe other emerging applications of plasmas in nanotechnologies.

AB - We have reviwed the role of plasma technologies in future development of nanoelectronics and in the development of other nanotechnologies. First we address the problems in application of the standard plasma etching procedure. We proceed to discuss the development of damage free plasma processes, in particular the etching by fast neutral beams. Fast neutral beams have a potential for implementation beyond the standard application in production of Integrated Circuits (lcs). In the second half of the paper we discuss some of the applications of micro discharges. The de Volte Ampere characteristics should be analyzed in order to reveal the predominant physical processes by studying E/N, pd and jd(2) scaling. We will also give some results related to rf microdischarge operatting at atmospheric pressure also known as plasma needle. It gives rise to new possibilities for medical treatments (including surgery) with minimum tissue damage. Finally we briefly describe other emerging applications of plasmas in nanotechnologies.

M3 - Conference contribution

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EP - 46

BT - Unknown Host Publication

CY - 345 E 47TH ST, NEW YORK, NY 10017 USA

ER -

Petrovic ZL, Malovic G, Radmilovic-Radjenovic M, Puac N, Maric D, Maguire PD et al. The role of non-equilibrium plasmas and micro-discharges in top down nanotechnologies and selforganized assembly of nanostructures. In Unknown Host Publication. 345 E 47TH ST, NEW YORK, NY 10017 USA. 2006. p. 39-46