The improvement in gas barrier performance and optical transparency of DLC-coated polymer by silicon incorporation

GA Abbas, P Papakonstantinou, TIT Okpalugo, JAD McLaughlin, J Filik, E Harkin-Jones

Research output: Contribution to journalArticle

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Abstract

In this study, induced modification caused by silicon incorporation (up to 21 at.%) in the composition and microstructure of hydrogenated amorphous carbon (a-C:H) thin films synthesized by plasma-enhanced chemical vapour deposition (PECVD) technique has been studied. The effect of this new microstructure on gas barrier performance and optical properties has been studied. A small amount of silicon incorporation (8.5 at.%) into the a-C:H coatings significantly improves the barrier performance, giving a gas reduction factor of 98%. Moreover, silicon incorporation results in an enhancement of optical band gap (doubled its value) and in a reduction of film density, stress, and refractive index. The silicon inclusion in the a-C:H structure breaks down large Size sp(2) carbon clusters and enhances the sp(3) bonding; however, the use of tetramethylsilane (TMS) precursor gas in the PECVD process also leads to the development of a more polymer-like structure due to the increasing hydrogen content. The development Of sp(3) bonding and the reduction of large sp(2) graphitic clusters are responsible for the enhancement of the optical band gap.We have demonstrated that Si-a-C:H thin film coatings can be used as a transparent barrier coating on polymer substrates with barrier performance comparable to that of onventional metal oxides coatings. (c) 2004 Elsevier B.V. All rights reserved.
LanguageEnglish
Pages201-206
JournalThin Solid Films
Volume482
Issue number1-2
DOIs
Publication statusPublished - Jun 2005

Fingerprint

Silicon
Transparency
Polymers
Gases
coatings
Coatings
Optical band gaps
polymers
silicon
Plasma enhanced chemical vapor deposition
gases
vapor deposition
Carbon clusters
Thin films
microstructure
Microstructure
augmentation
carbon
Amorphous carbon
thin films

Keywords

  • DLC
  • Si doping
  • gas barrier
  • optical properties

Cite this

@article{4abf6d7950be4ec59d70e562219708e6,
title = "The improvement in gas barrier performance and optical transparency of DLC-coated polymer by silicon incorporation",
abstract = "In this study, induced modification caused by silicon incorporation (up to 21 at.{\%}) in the composition and microstructure of hydrogenated amorphous carbon (a-C:H) thin films synthesized by plasma-enhanced chemical vapour deposition (PECVD) technique has been studied. The effect of this new microstructure on gas barrier performance and optical properties has been studied. A small amount of silicon incorporation (8.5 at.{\%}) into the a-C:H coatings significantly improves the barrier performance, giving a gas reduction factor of 98{\%}. Moreover, silicon incorporation results in an enhancement of optical band gap (doubled its value) and in a reduction of film density, stress, and refractive index. The silicon inclusion in the a-C:H structure breaks down large Size sp(2) carbon clusters and enhances the sp(3) bonding; however, the use of tetramethylsilane (TMS) precursor gas in the PECVD process also leads to the development of a more polymer-like structure due to the increasing hydrogen content. The development Of sp(3) bonding and the reduction of large sp(2) graphitic clusters are responsible for the enhancement of the optical band gap.We have demonstrated that Si-a-C:H thin film coatings can be used as a transparent barrier coating on polymer substrates with barrier performance comparable to that of onventional metal oxides coatings. (c) 2004 Elsevier B.V. All rights reserved.",
keywords = "DLC, Si doping, gas barrier, optical properties",
author = "GA Abbas and P Papakonstantinou and TIT Okpalugo and JAD McLaughlin and J Filik and E Harkin-Jones",
note = "Symposium on Synthesis, Characterisation and Advanced Application of Amorphous Carbon Films, Strasbourg, FRANCE, MAY 24-28, 2004",
year = "2005",
month = "6",
doi = "10.1016/j.tsf.2004.11.152",
language = "English",
volume = "482",
pages = "201--206",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "1-2",

}

The improvement in gas barrier performance and optical transparency of DLC-coated polymer by silicon incorporation. / Abbas, GA; Papakonstantinou, P; Okpalugo, TIT; McLaughlin, JAD; Filik, J; Harkin-Jones, E.

In: Thin Solid Films, Vol. 482, No. 1-2, 06.2005, p. 201-206.

Research output: Contribution to journalArticle

TY - JOUR

T1 - The improvement in gas barrier performance and optical transparency of DLC-coated polymer by silicon incorporation

AU - Abbas, GA

AU - Papakonstantinou, P

AU - Okpalugo, TIT

AU - McLaughlin, JAD

AU - Filik, J

AU - Harkin-Jones, E

N1 - Symposium on Synthesis, Characterisation and Advanced Application of Amorphous Carbon Films, Strasbourg, FRANCE, MAY 24-28, 2004

PY - 2005/6

Y1 - 2005/6

N2 - In this study, induced modification caused by silicon incorporation (up to 21 at.%) in the composition and microstructure of hydrogenated amorphous carbon (a-C:H) thin films synthesized by plasma-enhanced chemical vapour deposition (PECVD) technique has been studied. The effect of this new microstructure on gas barrier performance and optical properties has been studied. A small amount of silicon incorporation (8.5 at.%) into the a-C:H coatings significantly improves the barrier performance, giving a gas reduction factor of 98%. Moreover, silicon incorporation results in an enhancement of optical band gap (doubled its value) and in a reduction of film density, stress, and refractive index. The silicon inclusion in the a-C:H structure breaks down large Size sp(2) carbon clusters and enhances the sp(3) bonding; however, the use of tetramethylsilane (TMS) precursor gas in the PECVD process also leads to the development of a more polymer-like structure due to the increasing hydrogen content. The development Of sp(3) bonding and the reduction of large sp(2) graphitic clusters are responsible for the enhancement of the optical band gap.We have demonstrated that Si-a-C:H thin film coatings can be used as a transparent barrier coating on polymer substrates with barrier performance comparable to that of onventional metal oxides coatings. (c) 2004 Elsevier B.V. All rights reserved.

AB - In this study, induced modification caused by silicon incorporation (up to 21 at.%) in the composition and microstructure of hydrogenated amorphous carbon (a-C:H) thin films synthesized by plasma-enhanced chemical vapour deposition (PECVD) technique has been studied. The effect of this new microstructure on gas barrier performance and optical properties has been studied. A small amount of silicon incorporation (8.5 at.%) into the a-C:H coatings significantly improves the barrier performance, giving a gas reduction factor of 98%. Moreover, silicon incorporation results in an enhancement of optical band gap (doubled its value) and in a reduction of film density, stress, and refractive index. The silicon inclusion in the a-C:H structure breaks down large Size sp(2) carbon clusters and enhances the sp(3) bonding; however, the use of tetramethylsilane (TMS) precursor gas in the PECVD process also leads to the development of a more polymer-like structure due to the increasing hydrogen content. The development Of sp(3) bonding and the reduction of large sp(2) graphitic clusters are responsible for the enhancement of the optical band gap.We have demonstrated that Si-a-C:H thin film coatings can be used as a transparent barrier coating on polymer substrates with barrier performance comparable to that of onventional metal oxides coatings. (c) 2004 Elsevier B.V. All rights reserved.

KW - DLC

KW - Si doping

KW - gas barrier

KW - optical properties

U2 - 10.1016/j.tsf.2004.11.152

DO - 10.1016/j.tsf.2004.11.152

M3 - Article

VL - 482

SP - 201

EP - 206

JO - Thin Solid Films

T2 - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 1-2

ER -