Surface Modification of Silver Thin Films Using Low Power Chlorine Plasmas

C Escoffier, PD Maguire, ET McAdams, JAD McLaughlin

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Abstract

Modification of silver thin films to create Ag/AgCl thin film electrodes, using a plasma process, was investigated and the efficiency of the plasma technique was assessed. X-ray photoelectron spectroscopy measurements revealed the presence of AgCl within the thin film after plasma treatment. The observed binding energy peak shifts corroborated with values found in literature. Auger spectroscopy depth analysis showed that, under low input power conditions, the plasma process is controlled by the chlorine flow and the chamber pressure. The quantity of Cl integrated into the silver matrix increased with increasing chamber pressure. ©2001 The Electrochemical Society. All rights reserved.
Original languageEnglish
Pages (from-to)H31
JournalElectrochemical and Solid-State Letters
Volume4
Issue number12
DOIs
Publication statusPublished - 2001

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