Super-Resolution Defect Characterization Using Microwave Near-Field Resonance Reflectometry and Cross-correlation Image Processing

Oleksandr Malyuskin, Vincent Fusco

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3 Citations (Scopus)


A super-resolution defect characterization technique based on near-field resonance reflectometry and cross-correlation image processing is proposed in this paper. The hardware part of the microwave imaging system employs a novel loaded aperture (LA) probe which allows collimation of the electromagnetic field to approximately λ/10 focal spot(s) at λ/100 to λ/10 stand-off distances, λ being the wavelength of radiation in free space. The characteristic raw image spatial resolution of the LA probe is around λ/10 in one dimension with amplitude contrast/sensitivity exceeding 10–20 dB. It is demonstrated that the LA spatial resolution can be at least two times enhanced in two dimensions in the image plane using basic cross-correlation image processing while retaining a very high level of amplitude contrast of at least 10 dB.
Original languageEnglish
JournalSensing and Imaging
Early online date21 Jan 2017
Publication statusE-pub ahead of print - 21 Jan 2017



  • Near-field reflectometryMicrowave high-resolution imagingApertureElectromagnetic field enhancementMeasurementImageCorrelation

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