Substrate effects on the microstructure of hydrogenated amorphous carbon films

I Ahmad, SS Roy, MdA Rahman, TIT Okpalugo, PD Maguire, JAD McLaughlin

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

In this work, plasma enhanced chemical vapour deposition was used to prepare hydrogenated amorphous carbon films (a-C:H) on different substrates over a wide range of thickness. In order to observe clear substrate effect the films were produced under identical growth conditions. Raman and near edge X-ray absorption fine structure (NEXAFS) spectroscopies were employed to probe the chemical bonding of the films. For the films deposited on silicon substrates, the Raman WIG ratio and G-peak positions were constant for most thickness. For metallic and polymeric substrates, these parameters increased with Him thickness, suggesting a change from a sp(3)-bonded hydrogenated structure to a more sp(2) network, NEXAFS results also indicate a higher sp(2) content of a-C:H films grown on metals than silicon. The metals, which are poor carbide precursors, gave carbon films with low adhesion, easily delaminated from the substrate. The delamination can be decreased/eliminated by deposition of a thin (similar to 10 nm) silicon layer on stainless steel substrates prior to a-C:H coatings. Additionally we noted the electrical resistivity decreased with thickness and higher dielectric breakdown strength for a-C:H on silicon substrate. (C) 2008 Elsevier B.V. All rights reserved.
LanguageEnglish
Pages937-942
JournalCurrent Applied Physics
Volume9
Issue number5
DOIs
Publication statusPublished - Sep 2009

Fingerprint

Carbon films
Amorphous carbon
Amorphous films
microstructure
Microstructure
Silicon
carbon
Substrates
silicon
Metals
fine structure
X ray absorption near edge structure spectroscopy
Stainless Steel
X ray absorption
Plasma enhanced chemical vapor deposition
Electric breakdown
Delamination
carbides
metals
Carbides

Keywords

  • Diamond-like carbon
  • Chemical vapour deposition
  • Raman spectroscopy
  • Electrical properties

Cite this

Ahmad, I ; Roy, SS ; Rahman, MdA ; Okpalugo, TIT ; Maguire, PD ; McLaughlin, JAD. / Substrate effects on the microstructure of hydrogenated amorphous carbon films. In: Current Applied Physics. 2009 ; Vol. 9, No. 5. pp. 937-942.
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Substrate effects on the microstructure of hydrogenated amorphous carbon films. / Ahmad, I; Roy, SS; Rahman, MdA; Okpalugo, TIT; Maguire, PD; McLaughlin, JAD.

In: Current Applied Physics, Vol. 9, No. 5, 09.2009, p. 937-942.

Research output: Contribution to journalArticle

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T1 - Substrate effects on the microstructure of hydrogenated amorphous carbon films

AU - Ahmad, I

AU - Roy, SS

AU - Rahman, MdA

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AU - Maguire, PD

AU - McLaughlin, JAD

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