Abstract
Simulation studies have been performed on the AlGaN/GaN high electron mobility transistor (HEMT) with AlN spacer layer. The current-voltage characteristics have been studied with respect to different gate voltages and different doping concentrations. Studies have been performed on the quantum well depth variation corresponding to the designed HEMTs.
| Original language | English |
|---|---|
| Pages (from-to) | 32-36 |
| Number of pages | 5 |
| Journal | Journal of Semiconductor Devices and Circuits |
| Volume | 3 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published (in print/issue) - 2016 |
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