Abstract
Simulation studies have been performed on the AlGaN/GaN high electron mobility transistor (HEMT) with AlN spacer layer. The current-voltage characteristics have been studied with respect to different gate voltages and different doping concentrations. Studies have been performed on the quantum well depth variation corresponding to the designed HEMTs.
Original language | English |
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Pages (from-to) | 32-36 |
Number of pages | 5 |
Journal | Journal of Semiconductor Devices and Circuits |
Volume | 3 |
Issue number | 2 |
DOIs | |
Publication status | Published (in print/issue) - 2016 |