Reactive evaporation of metal wire and microdeposition of metal oxide using atmospheric pressure reactive microplasma jet

Y Shimizu, AC Bose, D Mariotti, T Sasaki, K Kirihara, T Suzuki, K Terashima, N Koshizaki

Research output: Contribution to journalArticle

35 Citations (Scopus)

Abstract

We developed a safe technique without using a toxic gas source to deposit tungsten oxide on a localized specific area using an atmospheric pressure microplasma jet. In this technique, a consumable tungsten wire, inserted into a quartz nozzle for microplasma generation, was etched with an O-2/Ar microplasma, and the resultant tungsten oxide was deposited on the substrate placed downstream. The process mechanism was determined by the detailed observation of the deposit and consumed wire surface after processing, and optical emission spectroscopy. This technique is expected to be utilized for the localized deposition of a variety of metal oxides by varying the kind of consumable metal wire.
LanguageEnglish
Pages8228-8234
JournalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
Volume45
Issue number10B
Early online date24 Oct 2006
DOIs
Publication statusE-pub ahead of print - 24 Oct 2006

Fingerprint

microplasmas
metal oxides
atmospheric pressure
tungsten oxides
evaporation
wire
deposits
metals
optical emission spectroscopy
nozzles
tungsten
quartz
gases

Cite this

@article{742802cd99dc4f188e6263218384409b,
title = "Reactive evaporation of metal wire and microdeposition of metal oxide using atmospheric pressure reactive microplasma jet",
abstract = "We developed a safe technique without using a toxic gas source to deposit tungsten oxide on a localized specific area using an atmospheric pressure microplasma jet. In this technique, a consumable tungsten wire, inserted into a quartz nozzle for microplasma generation, was etched with an O-2/Ar microplasma, and the resultant tungsten oxide was deposited on the substrate placed downstream. The process mechanism was determined by the detailed observation of the deposit and consumed wire surface after processing, and optical emission spectroscopy. This technique is expected to be utilized for the localized deposition of a variety of metal oxides by varying the kind of consumable metal wire.",
author = "Y Shimizu and AC Bose and D Mariotti and T Sasaki and K Kirihara and T Suzuki and K Terashima and N Koshizaki",
note = "6th International Conference on Reactive Plasma/23rd Symposium on Plasma Processing (ICRP-6/SPP-23), Matsushima, JAPAN, JAN 24-27, 2006",
year = "2006",
month = "10",
day = "24",
doi = "10.1143/JJAP.45.8228",
language = "English",
volume = "45",
pages = "8228--8234",
journal = "Japanese Journal of Applied Physics",
issn = "0021-4922",
number = "10B",

}

Reactive evaporation of metal wire and microdeposition of metal oxide using atmospheric pressure reactive microplasma jet. / Shimizu, Y; Bose, AC; Mariotti, D; Sasaki, T; Kirihara, K; Suzuki, T; Terashima, K; Koshizaki, N.

In: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, Vol. 45, No. 10B, 24.10.2006, p. 8228-8234.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Reactive evaporation of metal wire and microdeposition of metal oxide using atmospheric pressure reactive microplasma jet

AU - Shimizu, Y

AU - Bose, AC

AU - Mariotti, D

AU - Sasaki, T

AU - Kirihara, K

AU - Suzuki, T

AU - Terashima, K

AU - Koshizaki, N

N1 - 6th International Conference on Reactive Plasma/23rd Symposium on Plasma Processing (ICRP-6/SPP-23), Matsushima, JAPAN, JAN 24-27, 2006

PY - 2006/10/24

Y1 - 2006/10/24

N2 - We developed a safe technique without using a toxic gas source to deposit tungsten oxide on a localized specific area using an atmospheric pressure microplasma jet. In this technique, a consumable tungsten wire, inserted into a quartz nozzle for microplasma generation, was etched with an O-2/Ar microplasma, and the resultant tungsten oxide was deposited on the substrate placed downstream. The process mechanism was determined by the detailed observation of the deposit and consumed wire surface after processing, and optical emission spectroscopy. This technique is expected to be utilized for the localized deposition of a variety of metal oxides by varying the kind of consumable metal wire.

AB - We developed a safe technique without using a toxic gas source to deposit tungsten oxide on a localized specific area using an atmospheric pressure microplasma jet. In this technique, a consumable tungsten wire, inserted into a quartz nozzle for microplasma generation, was etched with an O-2/Ar microplasma, and the resultant tungsten oxide was deposited on the substrate placed downstream. The process mechanism was determined by the detailed observation of the deposit and consumed wire surface after processing, and optical emission spectroscopy. This technique is expected to be utilized for the localized deposition of a variety of metal oxides by varying the kind of consumable metal wire.

U2 - 10.1143/JJAP.45.8228

DO - 10.1143/JJAP.45.8228

M3 - Article

VL - 45

SP - 8228

EP - 8234

JO - Japanese Journal of Applied Physics

T2 - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

SN - 0021-4922

IS - 10B

ER -