Quantitative evaluation of local charge trapping in dielectric stacked gate structures using Kelvin probe force microscopy

G Lubarsky, R Shikler, N Ashkenasy, Y Rosenwaks

Research output: Contribution to journalArticle

12 Citations (Scopus)
LanguageEnglish
Pages1914
JournalJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Volume20
Issue number5
DOIs
Publication statusPublished - 2002

Cite this

@article{8101fadd7f5e4c1c9d31c38e0c9f6ffc,
title = "Quantitative evaluation of local charge trapping in dielectric stacked gate structures using Kelvin probe force microscopy",
author = "G Lubarsky and R Shikler and N Ashkenasy and Y Rosenwaks",
year = "2002",
doi = "10.1116/1.1502701",
language = "English",
volume = "20",
pages = "1914",
number = "5",

}

Quantitative evaluation of local charge trapping in dielectric stacked gate structures using Kelvin probe force microscopy. / Lubarsky, G; Shikler, R; Ashkenasy, N; Rosenwaks, Y.

Vol. 20, No. 5, 2002, p. 1914.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Quantitative evaluation of local charge trapping in dielectric stacked gate structures using Kelvin probe force microscopy

AU - Lubarsky, G

AU - Shikler, R

AU - Ashkenasy, N

AU - Rosenwaks, Y

PY - 2002

Y1 - 2002

U2 - 10.1116/1.1502701

DO - 10.1116/1.1502701

M3 - Article

VL - 20

SP - 1914

IS - 5

ER -