Quantitative evaluation of local charge trapping in dielectric stacked gate structures using Kelvin probe force microscopy

G Lubarsky, R Shikler, N Ashkenasy, Y Rosenwaks

Research output: Contribution to journalArticle

12 Citations (Scopus)
LanguageEnglish
Pages1914
JournalJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Volume20
Issue number5
DOIs
Publication statusPublished - 2002

Cite this

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title = "Quantitative evaluation of local charge trapping in dielectric stacked gate structures using Kelvin probe force microscopy",
author = "G Lubarsky and R Shikler and N Ashkenasy and Y Rosenwaks",
year = "2002",
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journal = "Journal of Vacuum Science and Technology B Microelectronics and Nanometer Structures",
issn = "1071-1023",
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TY - JOUR

T1 - Quantitative evaluation of local charge trapping in dielectric stacked gate structures using Kelvin probe force microscopy

AU - Lubarsky, G

AU - Shikler, R

AU - Ashkenasy, N

AU - Rosenwaks, Y

PY - 2002

Y1 - 2002

U2 - 10.1116/1.1502701

DO - 10.1116/1.1502701

M3 - Article

VL - 20

SP - 1914

JO - Journal of Vacuum Science and Technology B Microelectronics and Nanometer Structures

T2 - Journal of Vacuum Science and Technology B Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B Microelectronics and Nanometer Structures

SN - 1071-1023

IS - 5

ER -