Plasma chloriding of thin-film silver - A novel process in silver-silver chloride reference electrode fabrication

C Escoffier, PD Maguire, CMO Mahony, WG Graham, ET McAdams, JAD McLaughlin

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Silver thin films were modified using a novel plasma modification process for the development of thin-film silver-silver chloride reference electrodes. The surface, physical, and electrochemical properties of these electrodes were investigated by atomic force microscopy, thickness and resistivity measurement techniques, as well as impedance spectroscopy and potentiometry. After plasma treatment, thin-film growth was observed and the electrodes, in general, exhibited low interface impedance and a roughened surface. Evidence of a complex surface reorganization was found. Correlating plasma conditions with film properties suggested that increasing pressure and exposure duration increased species availability, therefore governing the reaction rates, while input power appeared to influence the type of surface chemical reactions. Results also indicated that Ar/Cl-2 mixtures should be employed rather than pure chlorine plasmas. (C) 2002 The Electrochemical Society.
LanguageEnglish
PagesH98-H102
JournalJournal of the Electrochemical Society
Volume149
Issue number4
DOIs
Publication statusPublished - Apr 2002

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silver chlorides
Silver
silver
Plasmas
Fabrication
Thin films
Electrodes
fabrication
electrodes
thin films
impedance
potentiometric analysis
Chlorine
Film growth
Electrochemical properties
surface properties
Reaction rates
Surface properties
chlorine
availability

Cite this

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title = "Plasma chloriding of thin-film silver - A novel process in silver-silver chloride reference electrode fabrication",
abstract = "Silver thin films were modified using a novel plasma modification process for the development of thin-film silver-silver chloride reference electrodes. The surface, physical, and electrochemical properties of these electrodes were investigated by atomic force microscopy, thickness and resistivity measurement techniques, as well as impedance spectroscopy and potentiometry. After plasma treatment, thin-film growth was observed and the electrodes, in general, exhibited low interface impedance and a roughened surface. Evidence of a complex surface reorganization was found. Correlating plasma conditions with film properties suggested that increasing pressure and exposure duration increased species availability, therefore governing the reaction rates, while input power appeared to influence the type of surface chemical reactions. Results also indicated that Ar/Cl-2 mixtures should be employed rather than pure chlorine plasmas. (C) 2002 The Electrochemical Society.",
author = "C Escoffier and PD Maguire and CMO Mahony and WG Graham and ET McAdams and JAD McLaughlin",
year = "2002",
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Plasma chloriding of thin-film silver - A novel process in silver-silver chloride reference electrode fabrication. / Escoffier, C; Maguire, PD; Mahony, CMO; Graham, WG; McAdams, ET; McLaughlin, JAD.

In: Journal of the Electrochemical Society, Vol. 149, No. 4, 04.2002, p. H98-H102.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Plasma chloriding of thin-film silver - A novel process in silver-silver chloride reference electrode fabrication

AU - Escoffier, C

AU - Maguire, PD

AU - Mahony, CMO

AU - Graham, WG

AU - McAdams, ET

AU - McLaughlin, JAD

PY - 2002/4

Y1 - 2002/4

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AB - Silver thin films were modified using a novel plasma modification process for the development of thin-film silver-silver chloride reference electrodes. The surface, physical, and electrochemical properties of these electrodes were investigated by atomic force microscopy, thickness and resistivity measurement techniques, as well as impedance spectroscopy and potentiometry. After plasma treatment, thin-film growth was observed and the electrodes, in general, exhibited low interface impedance and a roughened surface. Evidence of a complex surface reorganization was found. Correlating plasma conditions with film properties suggested that increasing pressure and exposure duration increased species availability, therefore governing the reaction rates, while input power appeared to influence the type of surface chemical reactions. Results also indicated that Ar/Cl-2 mixtures should be employed rather than pure chlorine plasmas. (C) 2002 The Electrochemical Society.

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