Nitrogen doping of amorphous DLC films by rf plasma dissociated nitrogen atom surface bombardment in a vacuum

AA Ogwu, D Magill, PD Maguire, JAD McLaughlin, RW McCullough, D Voulot

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Interpretations of recent (1999) theoretical first principles calculations in the literature based on the density functional theory using the local density approximation has led to suggestions that a low energy nitrogen surface bombardment of amorphous carbon films should lead to a reduction in the work function of the films. By applying a low energy nitrogen flux generated by a nitrogen plasma source to the surface of amorphous diamondlike carbon (DLC, a-C : H) films prepared by plasma enhanced chemical vapour deposition (PEVCD) in a vacuum, relatively high non-bonded nitrogen doping levels have been observed compared with DLC films prepared by other methods reported in the literature. The amorphous DLC films have been characterised by X-ray photoelectron spectroscopy and Raman spectroscopy before and after nitrogen bombardment. This novel processing route is expected to have an impact on residual stress relief and the field emission properties of amorphous DLC.
LanguageEnglish
Pages427
JournalSurface Engineering
Volume16
Issue number5
DOIs
Publication statusPublished - 2000

Fingerprint

Nitrogen plasma
Amorphous films
nitrogen atoms
bombardment
Nitrogen
Doping (additives)
Vacuum
nitrogen
Atoms
vacuum
Amorphous carbon
Local density approximation
Stress relief
Plasma sources
Carbon films
Plasma enhanced chemical vapor deposition
Field emission
nitrogen plasma
carbon
Density functional theory

Cite this

@article{c52bb08703f5466c86350f27ee5752b3,
title = "Nitrogen doping of amorphous DLC films by rf plasma dissociated nitrogen atom surface bombardment in a vacuum",
abstract = "Interpretations of recent (1999) theoretical first principles calculations in the literature based on the density functional theory using the local density approximation has led to suggestions that a low energy nitrogen surface bombardment of amorphous carbon films should lead to a reduction in the work function of the films. By applying a low energy nitrogen flux generated by a nitrogen plasma source to the surface of amorphous diamondlike carbon (DLC, a-C : H) films prepared by plasma enhanced chemical vapour deposition (PEVCD) in a vacuum, relatively high non-bonded nitrogen doping levels have been observed compared with DLC films prepared by other methods reported in the literature. The amorphous DLC films have been characterised by X-ray photoelectron spectroscopy and Raman spectroscopy before and after nitrogen bombardment. This novel processing route is expected to have an impact on residual stress relief and the field emission properties of amorphous DLC.",
author = "AA Ogwu and D Magill and PD Maguire and JAD McLaughlin and RW McCullough and D Voulot",
year = "2000",
doi = "10.1179/026708400101517422",
language = "English",
volume = "16",
pages = "427",
journal = "Surface Engineering",
issn = "0267-0844",
number = "5",

}

Nitrogen doping of amorphous DLC films by rf plasma dissociated nitrogen atom surface bombardment in a vacuum. / Ogwu, AA; Magill, D; Maguire, PD; McLaughlin, JAD; McCullough, RW; Voulot, D.

In: Surface Engineering, Vol. 16, No. 5, 2000, p. 427.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Nitrogen doping of amorphous DLC films by rf plasma dissociated nitrogen atom surface bombardment in a vacuum

AU - Ogwu, AA

AU - Magill, D

AU - Maguire, PD

AU - McLaughlin, JAD

AU - McCullough, RW

AU - Voulot, D

PY - 2000

Y1 - 2000

N2 - Interpretations of recent (1999) theoretical first principles calculations in the literature based on the density functional theory using the local density approximation has led to suggestions that a low energy nitrogen surface bombardment of amorphous carbon films should lead to a reduction in the work function of the films. By applying a low energy nitrogen flux generated by a nitrogen plasma source to the surface of amorphous diamondlike carbon (DLC, a-C : H) films prepared by plasma enhanced chemical vapour deposition (PEVCD) in a vacuum, relatively high non-bonded nitrogen doping levels have been observed compared with DLC films prepared by other methods reported in the literature. The amorphous DLC films have been characterised by X-ray photoelectron spectroscopy and Raman spectroscopy before and after nitrogen bombardment. This novel processing route is expected to have an impact on residual stress relief and the field emission properties of amorphous DLC.

AB - Interpretations of recent (1999) theoretical first principles calculations in the literature based on the density functional theory using the local density approximation has led to suggestions that a low energy nitrogen surface bombardment of amorphous carbon films should lead to a reduction in the work function of the films. By applying a low energy nitrogen flux generated by a nitrogen plasma source to the surface of amorphous diamondlike carbon (DLC, a-C : H) films prepared by plasma enhanced chemical vapour deposition (PEVCD) in a vacuum, relatively high non-bonded nitrogen doping levels have been observed compared with DLC films prepared by other methods reported in the literature. The amorphous DLC films have been characterised by X-ray photoelectron spectroscopy and Raman spectroscopy before and after nitrogen bombardment. This novel processing route is expected to have an impact on residual stress relief and the field emission properties of amorphous DLC.

U2 - 10.1179/026708400101517422

DO - 10.1179/026708400101517422

M3 - Article

VL - 16

SP - 427

JO - Surface Engineering

T2 - Surface Engineering

JF - Surface Engineering

SN - 0267-0844

IS - 5

ER -