NH3 sensing characteristics of pure and Al modified WO3 thin films

C. P. Goyal, N. S. Ramgir, P. K. Sharma, N. Datta, M. Kaur, V. Parey, A. K. Debnath, F. Z. Haque, D. K. Aswal, S. K. Gupta

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Citations (Scopus)

Abstract

Ammonia sensing properties of pure and Al modified WO3 thin films prepared using RF sputtering have been investigated. Both the sensor films exhibited a maximum response at an operating temperature of 250°C. Modification with Al has been demonstrated to improve the response kinetics in particular the response time (6 min) in comparison to that of pure WO 3 (8 min) towards NH3 (100 ppm). Interestingly, both the sensor films showed an increase in resistance i.e., a p-type behavior upon exposure to NH3.

Original languageEnglish
Title of host publicationProceedings of the International Conference on "Advanced Nanomaterials and Emerging Engineering Technologies", ICANMEET 2013
PublisherIEEE Xplore
Pages560-562
Number of pages3
ISBN (Print)9781479913794
DOIs
Publication statusPublished (in print/issue) - 30 Oct 2013
Event2013 International Conference on Advanced Nanomaterials and Emerging Engineering Technologies, ICANMEET 2013 - Chennai, India
Duration: 24 Jul 201326 Jul 2013

Conference

Conference2013 International Conference on Advanced Nanomaterials and Emerging Engineering Technologies, ICANMEET 2013
Country/TerritoryIndia
CityChennai
Period24/07/1326/07/13

Keywords

  • Al
  • NH
  • RF sputtering
  • Sensor
  • Thin Film
  • WO

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