Nanomechanical measurements on polymers using contact mode atomic force microscopy

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

Contact mode atomic force microscopy (AFM) was used for measuring the nanomechanical properties of polymers. The measurements include hardness and wear testing over a submicron scale with direct imaging of the deformed surfaces. The results are discussed with a simple continuum mechanics approach and the technological limitations of the technique are also considered. (C) 1999 Elsevier Science S.A. All rights reserved.
LanguageEnglish
Pages258-264
JournalThin Solid Films
Volume339
Issue number1-2
Publication statusPublished - Feb 1999

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atomic force microscopy
continuum mechanics
polymers
hardness

Keywords

  • atomic force microscopy
  • hardness
  • polymers
  • surface morphology

Cite this

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title = "Nanomechanical measurements on polymers using contact mode atomic force microscopy",
abstract = "Contact mode atomic force microscopy (AFM) was used for measuring the nanomechanical properties of polymers. The measurements include hardness and wear testing over a submicron scale with direct imaging of the deformed surfaces. The results are discussed with a simple continuum mechanics approach and the technological limitations of the technique are also considered. (C) 1999 Elsevier Science S.A. All rights reserved.",
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author = "P Lemoine and JAD McLaughlin",
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Nanomechanical measurements on polymers using contact mode atomic force microscopy. / Lemoine, P; McLaughlin, JAD.

In: Thin Solid Films, Vol. 339, No. 1-2, 02.1999, p. 258-264.

Research output: Contribution to journalArticle

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AB - Contact mode atomic force microscopy (AFM) was used for measuring the nanomechanical properties of polymers. The measurements include hardness and wear testing over a submicron scale with direct imaging of the deformed surfaces. The results are discussed with a simple continuum mechanics approach and the technological limitations of the technique are also considered. (C) 1999 Elsevier Science S.A. All rights reserved.

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