Modeling and fabrication of a microelectromechanical microwave switch

Ching Liang Dai, Heng Ming Hsu, Ming Chang Tsai, Ming Ming Hsieh, Ming Wei Chang

Research output: Contribution to journalArticle

26 Citations (Scopus)

Abstract

A microelectromechanical microwave switch manufactured by using a complementary metal oxide semiconductor (CMOS) post-process has been implemented. An equivalent circuit model is proposed to analyze the performance of the microwave switch. The components of the microwave switch consist of a coplanar waveguide (CPW), a suspended membrane and supported springs. The post-process requires only one wet etching to etch the sacrificial layer, and to release the suspended structures. Experimental results show that the switch has an insertion loss of -2 dB at 50 GHz and an isolation of -15 dB at 50 GHz. The driving voltage of the switch approximates to 19 V.

LanguageEnglish
Pages519-524
Number of pages6
JournalMicroelectronics Journal
Volume38
Issue number4-5
DOIs
Publication statusPublished - 1 Apr 2007

Fingerprint

switches
Microwaves
Switches
microwaves
Fabrication
fabrication
Wet etching
Coplanar waveguides
Insertion losses
equivalent circuits
insertion loss
Equivalent circuits
isolation
CMOS
Metals
etching
membranes
waveguides
Membranes
Electric potential

Keywords

  • CMOS
  • Micro actuator
  • Microwave switch

Cite this

Dai, Ching Liang ; Hsu, Heng Ming ; Tsai, Ming Chang ; Hsieh, Ming Ming ; Chang, Ming Wei. / Modeling and fabrication of a microelectromechanical microwave switch. In: Microelectronics Journal. 2007 ; Vol. 38, No. 4-5. pp. 519-524.
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Modeling and fabrication of a microelectromechanical microwave switch. / Dai, Ching Liang; Hsu, Heng Ming; Tsai, Ming Chang; Hsieh, Ming Ming; Chang, Ming Wei.

In: Microelectronics Journal, Vol. 38, No. 4-5, 01.04.2007, p. 519-524.

Research output: Contribution to journalArticle

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