Microdeposition of metal and oxide structures using ultrashort laser pulses

I Zergioti, S Mailis, NA Vainos, P Papakonstantinou, C Kalpouzos, CP Grigoropoulos, C Fotakis

Research output: Contribution to journalArticle

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Abstract

Abstract. Microdeposition of chromium metal and indium oxide microstructures via femtosecond KrF excimer laser (248 nm) ablation in a forward-transfer mode has been studied. The short pulse length, the short absorption length, and the consequently limited thermal diffusion, lower the ablation threshold and enable the deposition of high-definition features. Experiments carried out in a low-vacuum(0:1Torr) environment result in highly reproducible, well-adhered structures of submicron size. Microdeposition of Cr and polycrystalline In2O3 on glass and silicon substrates is performed. The superior quality of the results allows the direct, one-step fabrication of binary-amplitude and multilevel optical diffractive structures.
LanguageEnglish
Pages579-582
JournalApplied Physics A: Materials Science and Processing
Volume66
DOIs
Publication statusPublished - 9 Feb 1998

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Ablation
Ultrashort pulses
Oxides
Thermal diffusion
Excimer lasers
Metals
Indium
Chromium
Vacuum
Fabrication
Glass
Silicon
Microstructure
Substrates
Experiments

Cite this

Zergioti, I ; Mailis, S ; Vainos, NA ; Papakonstantinou, P ; Kalpouzos, C ; Grigoropoulos, CP ; Fotakis, C. / Microdeposition of metal and oxide structures using ultrashort laser pulses. In: Applied Physics A: Materials Science and Processing. 1998 ; Vol. 66. pp. 579-582.
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Microdeposition of metal and oxide structures using ultrashort laser pulses. / Zergioti, I; Mailis, S; Vainos, NA; Papakonstantinou, P; Kalpouzos, C; Grigoropoulos, CP; Fotakis, C.

In: Applied Physics A: Materials Science and Processing, Vol. 66, 09.02.1998, p. 579-582.

Research output: Contribution to journalArticle

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AU - Zergioti, I

AU - Mailis, S

AU - Vainos, NA

AU - Papakonstantinou, P

AU - Kalpouzos, C

AU - Grigoropoulos, CP

AU - Fotakis, C

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