Abstract. Microdeposition of chromium metal and indium oxide microstructures via femtosecond KrF excimer laser (248 nm) ablation in a forward-transfer mode has been studied. The short pulse length, the short absorption length, and the consequently limited thermal diffusion, lower the ablation threshold and enable the deposition of high-deﬁnition features. Experiments carried out in a low-vacuum(0:1Torr) environment result in highly reproducible, well-adhered structures of submicron size. Microdeposition of Cr and polycrystalline In2O3 on glass and silicon substrates is performed. The superior quality of the results allows the direct, one-step fabrication of binary-amplitude and multilevel optical diffractive structures.
|Journal||Applied Physics A: Materials Science and Processing|
|Publication status||Published - 9 Feb 1998|
Zergioti, I., Mailis, S., Vainos, NA., Papakonstantinou, P., Kalpouzos, C., Grigoropoulos, CP., & Fotakis, C. (1998). Microdeposition of metal and oxide structures using ultrashort laser pulses. Applied Physics A: Materials Science and Processing, 66, 579-582. https://doi.org/10.1007/s003390050717