Microdeposition of metal and oxide structures using ultrashort laser pulses

I Zergioti, S Mailis, NA Vainos, P Papakonstantinou, C Kalpouzos, CP Grigoropoulos, C Fotakis

Research output: Contribution to journalArticle

142 Citations (Scopus)

Abstract

Abstract. Microdeposition of chromium metal and indium oxide microstructures via femtosecond KrF excimer laser (248 nm) ablation in a forward-transfer mode has been studied. The short pulse length, the short absorption length, and the consequently limited thermal diffusion, lower the ablation threshold and enable the deposition of high-definition features. Experiments carried out in a low-vacuum(0:1Torr) environment result in highly reproducible, well-adhered structures of submicron size. Microdeposition of Cr and polycrystalline In2O3 on glass and silicon substrates is performed. The superior quality of the results allows the direct, one-step fabrication of binary-amplitude and multilevel optical diffractive structures.
Original languageEnglish
Pages (from-to)579-582
JournalApplied Physics A: Materials Science and Processing
Volume66
DOIs
Publication statusPublished - 9 Feb 1998

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