TY - JOUR
T1 - Microdeposition of metal and oxide structures using ultrashort laser pulses
AU - Zergioti, I
AU - Mailis, S
AU - Vainos, NA
AU - Papakonstantinou, P
AU - Kalpouzos, C
AU - Grigoropoulos, CP
AU - Fotakis, C
PY - 1998/2/9
Y1 - 1998/2/9
N2 - Abstract. Microdeposition of chromium metal and indium oxide microstructures via femtosecond KrF excimer laser (248 nm) ablation in a forward-transfer mode has been studied. The short pulse length, the short absorption length, and the consequently limited thermal diffusion, lower the ablation threshold and enable the deposition of high-definition features. Experiments carried out in a low-vacuum(0:1Torr) environment result in highly reproducible, well-adhered structures of submicron size. Microdeposition of Cr and polycrystalline In2O3 on glass and silicon substrates is performed. The superior quality of the results allows the direct, one-step fabrication of binary-amplitude and multilevel optical diffractive structures.
AB - Abstract. Microdeposition of chromium metal and indium oxide microstructures via femtosecond KrF excimer laser (248 nm) ablation in a forward-transfer mode has been studied. The short pulse length, the short absorption length, and the consequently limited thermal diffusion, lower the ablation threshold and enable the deposition of high-definition features. Experiments carried out in a low-vacuum(0:1Torr) environment result in highly reproducible, well-adhered structures of submicron size. Microdeposition of Cr and polycrystalline In2O3 on glass and silicon substrates is performed. The superior quality of the results allows the direct, one-step fabrication of binary-amplitude and multilevel optical diffractive structures.
U2 - 10.1007/s003390050717
DO - 10.1007/s003390050717
M3 - Article
VL - 66
SP - 579
EP - 582
JO - Applied Physics A: Materials Science and Processing
JF - Applied Physics A: Materials Science and Processing
ER -