Mechanical characterisation of nanocrystalline graphite using micromechanical structures

Sam Fishlock, David Grech, John McBride, Harold Chong, Suan Hui Pu

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Conductive nanocrystalline graphite has been deposited using plasma-enhanced chemical vapour deposition at 750 °C, directly onto silicon substrates without any catalyst and fabricated into micromechanical membrane and beam structures. Using the buckling profile of the membrane and beam structures, we measure a built-in strain of − 0.0142 and through wafer-bow measurement, a compressive stress of 436 MPa. From this we have calculated the Young's modulus of nanographite as 23.0 ± 2.7 GPa. This represents a scalable method for fabricating nanographite MEMS and NEMS devices via a microfabrication-compatible process and provides useful mechanical properties to enable design of future devices.
LanguageEnglish
Article numberVolume 159
Pages184-189
Number of pages6
JournalMicroelectronic Engineering
DOIs
Publication statusPublished - 22 Mar 2016

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membrane structures
graphite
bows
buckling
microelectromechanical systems
modulus of elasticity
vapor deposition
wafers
mechanical properties
catalysts
silicon
profiles

Cite this

Fishlock, Sam ; Grech, David ; McBride, John ; Chong, Harold ; Hui Pu, Suan. / Mechanical characterisation of nanocrystalline graphite using micromechanical structures. In: Microelectronic Engineering. 2016 ; pp. 184-189.
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Mechanical characterisation of nanocrystalline graphite using micromechanical structures. / Fishlock, Sam; Grech, David; McBride, John; Chong, Harold; Hui Pu, Suan.

In: Microelectronic Engineering, 22.03.2016, p. 184-189.

Research output: Contribution to journalArticle

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T1 - Mechanical characterisation of nanocrystalline graphite using micromechanical structures

AU - Fishlock, Sam

AU - Grech, David

AU - McBride, John

AU - Chong, Harold

AU - Hui Pu, Suan

N1 - Evidence attached - uploaded to Southampton eprints repository before deadline

PY - 2016/3/22

Y1 - 2016/3/22

N2 - Conductive nanocrystalline graphite has been deposited using plasma-enhanced chemical vapour deposition at 750 °C, directly onto silicon substrates without any catalyst and fabricated into micromechanical membrane and beam structures. Using the buckling profile of the membrane and beam structures, we measure a built-in strain of − 0.0142 and through wafer-bow measurement, a compressive stress of 436 MPa. From this we have calculated the Young's modulus of nanographite as 23.0 ± 2.7 GPa. This represents a scalable method for fabricating nanographite MEMS and NEMS devices via a microfabrication-compatible process and provides useful mechanical properties to enable design of future devices.

AB - Conductive nanocrystalline graphite has been deposited using plasma-enhanced chemical vapour deposition at 750 °C, directly onto silicon substrates without any catalyst and fabricated into micromechanical membrane and beam structures. Using the buckling profile of the membrane and beam structures, we measure a built-in strain of − 0.0142 and through wafer-bow measurement, a compressive stress of 436 MPa. From this we have calculated the Young's modulus of nanographite as 23.0 ± 2.7 GPa. This represents a scalable method for fabricating nanographite MEMS and NEMS devices via a microfabrication-compatible process and provides useful mechanical properties to enable design of future devices.

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DO - 10.1016/j.mee.2016.03.040

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EP - 189

JO - Microelectronic Engineering

T2 - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

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