TY - JOUR
T1 - Mechanical characterisation of nanocrystalline graphite using micromechanical structures
AU - Fishlock, Sam
AU - Grech, David
AU - McBride, John
AU - Chong, Harold
AU - Hui Pu, Suan
PY - 2016/3/22
Y1 - 2016/3/22
N2 - Conductive nanocrystalline graphite has been deposited using plasma-enhanced chemical vapour deposition at 750 °C, directly onto silicon substrates without any catalyst and fabricated into micromechanical membrane and beam structures. Using the buckling profile of the membrane and beam structures, we measure a built-in strain of − 0.0142 and through wafer-bow measurement, a compressive stress of 436 MPa. From this we have calculated the Young's modulus of nanographite as 23.0 ± 2.7 GPa. This represents a scalable method for fabricating nanographite MEMS and NEMS devices via a microfabrication-compatible process and provides useful mechanical properties to enable design of future devices.
AB - Conductive nanocrystalline graphite has been deposited using plasma-enhanced chemical vapour deposition at 750 °C, directly onto silicon substrates without any catalyst and fabricated into micromechanical membrane and beam structures. Using the buckling profile of the membrane and beam structures, we measure a built-in strain of − 0.0142 and through wafer-bow measurement, a compressive stress of 436 MPa. From this we have calculated the Young's modulus of nanographite as 23.0 ± 2.7 GPa. This represents a scalable method for fabricating nanographite MEMS and NEMS devices via a microfabrication-compatible process and provides useful mechanical properties to enable design of future devices.
U2 - 10.1016/j.mee.2016.03.040
DO - 10.1016/j.mee.2016.03.040
M3 - Article
SP - 184
EP - 189
JO - Microelectronic Engineering
JF - Microelectronic Engineering
SN - 0167-9317
M1 - Volume 159
ER -