Conductive nanocrystalline graphite has been deposited using plasma-enhanced chemical vapour deposition at 750 °C, directly onto silicon substrates without any catalyst and fabricated into micromechanical membrane and beam structures. Using the buckling profile of the membrane and beam structures, we measure a built-in strain of − 0.0142 and through wafer-bow measurement, a compressive stress of 436 MPa. From this we have calculated the Young's modulus of nanographite as 23.0 ± 2.7 GPa. This represents a scalable method for fabricating nanographite MEMS and NEMS devices via a microfabrication-compatible process and provides useful mechanical properties to enable design of future devices.
Fishlock, S., Grech, D., McBride, J., Chong, H., & Hui Pu, S. (2016). Mechanical characterisation of nanocrystalline graphite using micromechanical structures. Microelectronic Engineering, 184-189. [Volume 159]. https://doi.org/10.1016/j.mee.2016.03.040