Mask assisted fabrication of nanoislands of BiFeO3 by ion beam milling

A. Morelli, F. Johann, N. Schammelt, D. McGrouther, I. Vrejoiu

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

We report on a low-damage method for direct and rapid fabrication of arrays of epitaxial BiFeO3 (BFO) nanoislands. An array of aluminium dots is evaporated through a stencil mask on top of an epitaxial BiFeO3 thin film. Low energy focused ion beam milling of an area several microns wide containing the array-covered film leads to removal of the bismuth ferrite in between the aluminium-masked dots. By chemical etching of the remaining aluminium, nanoscale epitaxial bismuth ferrite islands with diameter ∼250 nm were obtained. Piezoresponse force microscopy showed that as-fabricated structures exhibited good piezoelectric and ferroelectric properties, with polarization state retention of several days.

LanguageEnglish
Article number154101
JournalJournal of Applied Physics
Volume113
Issue number15
DOIs
Publication statusPublished - 1 Apr 2013

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masks
ion beams
aluminum
bismuth
fabrication
ferrites
etching
damage
microscopy
polarization
thin films
energy

Cite this

Morelli, A. ; Johann, F. ; Schammelt, N. ; McGrouther, D. ; Vrejoiu, I. / Mask assisted fabrication of nanoislands of BiFeO3 by ion beam milling. In: Journal of Applied Physics. 2013 ; Vol. 113, No. 15.
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Mask assisted fabrication of nanoislands of BiFeO3 by ion beam milling. / Morelli, A.; Johann, F.; Schammelt, N.; McGrouther, D.; Vrejoiu, I.

In: Journal of Applied Physics, Vol. 113, No. 15, 154101, 01.04.2013.

Research output: Contribution to journalArticle

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