Intrinsic stress measured on ultra-thin amorphous carbon films deposited on AFM cantilevers

Research output: Contribution to journalArticle

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Abstract

Ultra-thin amorphous carbon films were deposited onto atomic force cantilevers by plasma enhanced chemical vapour deposition. High magnification scanning electron micrographs at 30 kV reveal that the AFM tip is not affected by the deposition but its radius is broadened by the presence of the coating. Energy dispersive X-ray analysis at 4 kV shows that the film mostly coats one side of the lever, resulting in a bending of the cantilever, readily observable by scanning electron microscopy. This deformation is elastic and is caused by an internal compressive stress of 2.60 and 2.54 GPa, respectively, for 20-nm and 110-nm-thick films. After 15 at.% Si incorporation, these stresses are reduced to 0.97 and 0.78 GPa. It is believed that the increased hydrogenation upon silicon addition causes a loosening of the carbon network structure and is, therefore, responsible for the observed stress relief.Copyright © 2001 Elsevier Science B.V. All rights reserved.
LanguageEnglish
Pages94-98
JournalDiamond and Related Materials
Volume10
Issue number1
DOIs
Publication statusPublished - 2001

Fingerprint

Stress relief
Energy dispersive X ray analysis
Carbon films
Amorphous carbon
Elastic deformation
Silicon
Amorphous films
Plasma enhanced chemical vapor deposition
Compressive stress
Thick films
Hydrogenation
Residual stresses
Carbon
Scanning
Coatings
Scanning electron microscopy
Electrons

Keywords

  • Amorphous carbon
  • AFM cantilever
  • Compressive stresses
  • Ultra-thin films

Cite this

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title = "Intrinsic stress measured on ultra-thin amorphous carbon films deposited on AFM cantilevers",
abstract = "Ultra-thin amorphous carbon films were deposited onto atomic force cantilevers by plasma enhanced chemical vapour deposition. High magnification scanning electron micrographs at 30 kV reveal that the AFM tip is not affected by the deposition but its radius is broadened by the presence of the coating. Energy dispersive X-ray analysis at 4 kV shows that the film mostly coats one side of the lever, resulting in a bending of the cantilever, readily observable by scanning electron microscopy. This deformation is elastic and is caused by an internal compressive stress of 2.60 and 2.54 GPa, respectively, for 20-nm and 110-nm-thick films. After 15 at.{\%} Si incorporation, these stresses are reduced to 0.97 and 0.78 GPa. It is believed that the increased hydrogenation upon silicon addition causes a loosening of the carbon network structure and is, therefore, responsible for the observed stress relief.Copyright {\circledC} 2001 Elsevier Science B.V. All rights reserved.",
keywords = "Amorphous carbon, AFM cantilever, Compressive stresses, Ultra-thin films",
author = "P Lemoine and JF Zhao and A Bell and PD Maguire and JAD McLaughlin",
year = "2001",
doi = "10.1016/S0925-9635(00)00455-6",
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Intrinsic stress measured on ultra-thin amorphous carbon films deposited on AFM cantilevers. / Lemoine, P; Zhao, JF; Bell, A; Maguire, PD; McLaughlin, JAD.

In: Diamond and Related Materials, Vol. 10, No. 1, 2001, p. 94-98.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Intrinsic stress measured on ultra-thin amorphous carbon films deposited on AFM cantilevers

AU - Lemoine, P

AU - Zhao, JF

AU - Bell, A

AU - Maguire, PD

AU - McLaughlin, JAD

PY - 2001

Y1 - 2001

N2 - Ultra-thin amorphous carbon films were deposited onto atomic force cantilevers by plasma enhanced chemical vapour deposition. High magnification scanning electron micrographs at 30 kV reveal that the AFM tip is not affected by the deposition but its radius is broadened by the presence of the coating. Energy dispersive X-ray analysis at 4 kV shows that the film mostly coats one side of the lever, resulting in a bending of the cantilever, readily observable by scanning electron microscopy. This deformation is elastic and is caused by an internal compressive stress of 2.60 and 2.54 GPa, respectively, for 20-nm and 110-nm-thick films. After 15 at.% Si incorporation, these stresses are reduced to 0.97 and 0.78 GPa. It is believed that the increased hydrogenation upon silicon addition causes a loosening of the carbon network structure and is, therefore, responsible for the observed stress relief.Copyright © 2001 Elsevier Science B.V. All rights reserved.

AB - Ultra-thin amorphous carbon films were deposited onto atomic force cantilevers by plasma enhanced chemical vapour deposition. High magnification scanning electron micrographs at 30 kV reveal that the AFM tip is not affected by the deposition but its radius is broadened by the presence of the coating. Energy dispersive X-ray analysis at 4 kV shows that the film mostly coats one side of the lever, resulting in a bending of the cantilever, readily observable by scanning electron microscopy. This deformation is elastic and is caused by an internal compressive stress of 2.60 and 2.54 GPa, respectively, for 20-nm and 110-nm-thick films. After 15 at.% Si incorporation, these stresses are reduced to 0.97 and 0.78 GPa. It is believed that the increased hydrogenation upon silicon addition causes a loosening of the carbon network structure and is, therefore, responsible for the observed stress relief.Copyright © 2001 Elsevier Science B.V. All rights reserved.

KW - Amorphous carbon

KW - AFM cantilever

KW - Compressive stresses

KW - Ultra-thin films

U2 - 10.1016/S0925-9635(00)00455-6

DO - 10.1016/S0925-9635(00)00455-6

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SN - 0925-9635

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