Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures

Manuel Macias-Montero; F. J. Garcia-Garcia; R. Álvarez; J. Gil-Rostra; J. C. González; J. Cotrino; A. R. Gonzalez-Elipe; A. Palmero

doi:10.1063/1.3691950

Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures

Manuel Macias-Montero
, F. J. Garcia-Garcia
, R. Álvarez
, J. Gil-Rostra
, J. C. González
, J. Cotrino
, A. R. Gonzalez-Elipe
, A. Palmero

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	054312
Journal	Journal of Applied Physics
Volume	111
Issue number	5
DOIs	https://doi.org/10.1063/1.3691950
Publication status	Published (in print/issue) - 2012

Keywords

Plasma
ion impingement
magnetron sputtering
thin films growth

Access to Document

10.1063/1.3691950

Cite this

Macias-Montero, M., Garcia-Garcia, F. J., Álvarez, R., Gil-Rostra, J., González, J. C., Cotrino, J., Gonzalez-Elipe, A. R., & Palmero, A. (2012). Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures. Journal of Applied Physics, 111(5), 054312. https://doi.org/10.1063/1.3691950

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title = "Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures",

keywords = "Plasma, ion impingement, magnetron sputtering, thin films growth",

author = "Manuel Macias-Montero and Garcia-Garcia, \{F. J.\} and R. {\'A}lvarez and J. Gil-Rostra and Gonz{\'a}lez, \{J. C.\} and J. Cotrino and Gonzalez-Elipe, \{A. R.\} and A. Palmero",

year = "2012",

doi = "10.1063/1.3691950",

language = "English",

volume = "111",

pages = "054312",

journal = "Journal of Applied Physics",

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Macias-Montero, M, Garcia-Garcia, FJ, Álvarez, R, Gil-Rostra, J, González, JC, Cotrino, J, Gonzalez-Elipe, AR & Palmero, A 2012, 'Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures', Journal of Applied Physics, vol. 111, no. 5, pp. 054312. https://doi.org/10.1063/1.3691950

TY - JOUR

T1 - Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures

AU - Macias-Montero, Manuel

AU - Garcia-Garcia, F. J.

AU - Álvarez, R.

AU - Gil-Rostra, J.

AU - González, J. C.

AU - Cotrino, J.

AU - Gonzalez-Elipe, A. R.

AU - Palmero, A.

PY - 2012

Y1 - 2012

KW - Plasma

KW - ion impingement

KW - magnetron sputtering

KW - thin films growth

U2 - 10.1063/1.3691950

DO - 10.1063/1.3691950

M3 - Article

SN - 1089-7550

VL - 111

SP - 054312

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 5

ER -