Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures

Manuel Macias-Montero, F. J. Garcia-Garcia, R. Álvarez, J. Gil-Rostra, J. C. González, J. Cotrino, A. R. Gonzalez-Elipe, A. Palmero

    Research output: Contribution to journalArticle

    24 Citations (Scopus)
    LanguageEnglish
    Pages054312
    JournalJournal of Applied Physics
    Volume111
    Issue number5
    DOIs
    Publication statusPublished - 2012

    Keywords

    • Plasma
    • ion impingement
    • magnetron sputtering
    • thin films growth

    Cite this

    Macias-Montero, M., Garcia-Garcia, F. J., Álvarez, R., Gil-Rostra, J., González, J. C., Cotrino, J., ... Palmero, A. (2012). Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures. Journal of Applied Physics, 111(5), 054312. https://doi.org/10.1063/1.3691950
    Macias-Montero, Manuel ; Garcia-Garcia, F. J. ; Álvarez, R. ; Gil-Rostra, J. ; González, J. C. ; Cotrino, J. ; Gonzalez-Elipe, A. R. ; Palmero, A. / Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures. In: Journal of Applied Physics. 2012 ; Vol. 111, No. 5. pp. 054312.
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    title = "Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures",
    keywords = "Plasma, ion impingement, magnetron sputtering, thin films growth",
    author = "Manuel Macias-Montero and Garcia-Garcia, {F. J.} and R. Álvarez and J. Gil-Rostra and González, {J. C.} and J. Cotrino and Gonzalez-Elipe, {A. R.} and A. Palmero",
    year = "2012",
    doi = "10.1063/1.3691950",
    language = "English",
    volume = "111",
    pages = "054312",
    journal = "Journal of Applied Physics",
    issn = "0021-8979",
    publisher = "American Institute of Physics",
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    }

    Macias-Montero, M, Garcia-Garcia, FJ, Álvarez, R, Gil-Rostra, J, González, JC, Cotrino, J, Gonzalez-Elipe, AR & Palmero, A 2012, 'Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures', Journal of Applied Physics, vol. 111, no. 5, pp. 054312. https://doi.org/10.1063/1.3691950

    Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures. / Macias-Montero, Manuel; Garcia-Garcia, F. J.; Álvarez, R.; Gil-Rostra, J.; González, J. C.; Cotrino, J.; Gonzalez-Elipe, A. R.; Palmero, A.

    In: Journal of Applied Physics, Vol. 111, No. 5, 2012, p. 054312.

    Research output: Contribution to journalArticle

    TY - JOUR

    T1 - Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures

    AU - Macias-Montero, Manuel

    AU - Garcia-Garcia, F. J.

    AU - Álvarez, R.

    AU - Gil-Rostra, J.

    AU - González, J. C.

    AU - Cotrino, J.

    AU - Gonzalez-Elipe, A. R.

    AU - Palmero, A.

    PY - 2012

    Y1 - 2012

    KW - Plasma

    KW - ion impingement

    KW - magnetron sputtering

    KW - thin films growth

    U2 - 10.1063/1.3691950

    DO - 10.1063/1.3691950

    M3 - Article

    VL - 111

    SP - 054312

    JO - Journal of Applied Physics

    T2 - Journal of Applied Physics

    JF - Journal of Applied Physics

    SN - 0021-8979

    IS - 5

    ER -