Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures

Manuel Macias-Montero, F. J. Garcia-Garcia, R. Álvarez, J. Gil-Rostra, J. C. González, J. Cotrino, A. R. Gonzalez-Elipe, A. Palmero

    Research output: Contribution to journalArticle

    24 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)054312
    JournalJournal of Applied Physics
    Volume111
    Issue number5
    DOIs
    Publication statusPublished - 2012

    Keywords

    • Plasma
    • ion impingement
    • magnetron sputtering
    • thin films growth

    Cite this

    Macias-Montero, M., Garcia-Garcia, F. J., Álvarez, R., Gil-Rostra, J., González, J. C., Cotrino, J., Gonzalez-Elipe, A. R., & Palmero, A. (2012). Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures. Journal of Applied Physics, 111(5), 054312. https://doi.org/10.1063/1.3691950