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First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
Glen N. Fomengia
, Michael Nolan
, Simon D. Elliott
School of Engineering
Faculty Of Computing, Eng. & Built Env.
Research output
:
Contribution to journal
›
Article
›
peer-review
20
Citations (Scopus)
376
Downloads (Pure)
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Dive into the research topics of 'First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina'. Together they form a unique fingerprint.
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Chemistry
Mechanistic Study
100%
First Principle
100%
Atomic Layer Epitaxy
100%
Aluminum Oxide
100%
Desorption
50%
Metal Oxide
33%
Densification
33%
Chemistry
16%
Redox Reactions
16%
Hydroxyl Group
16%
Coordination Number
16%
Formate
16%
electronics
16%
Oxygen Atom
16%
Singlet Oxygen
16%
Exothermic Reaction
16%
Density Functional Theory
16%
Material Science
Aluminum Oxide
100%
Surface (Surface Science)
100%
Desorption
42%
Film
42%
Metal Oxide
28%
Density
14%
Redox Process
14%
Chemical Engineering
Atomic Layer Deposition
100%
Desorption
50%
Film
50%