Ferroelectric nanostructures fabricated by focused-ion-beam milling in epitaxial BiFeO3 thin films

A. Morelli, F. Johann, N. Schammelt, I. Vrejoiu

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

We studied a suitable route to fabricate ferroelectric islands by focused-ion-beam milling in bismuth ferrite epitaxial thin films. Piezoresponse force microscopy shows that the damage induced by the milling process is extended to 1νm away from the edge of the focused-ion-beam patterned islands. After a combined vacuum and oxygen atmosphere annealing procedure, ferroelectricity is fully recovered in structures with sizes down to 500nm, while for 250nm islands the defects at the interfaces induce polarization direction pinning.

LanguageEnglish
Article number265303
JournalNanotechnology
Volume22
Issue number26
DOIs
Publication statusPublished - 1 Jul 2011

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Epitaxial films
Focused ion beams
Ferroelectric materials
Nanostructures
Ferroelectricity
Thin films
Bismuth
Ferrite
Microscopic examination
Vacuum
Annealing
Polarization
Oxygen
Defects
Direction compound

Cite this

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Ferroelectric nanostructures fabricated by focused-ion-beam milling in epitaxial BiFeO3 thin films. / Morelli, A.; Johann, F.; Schammelt, N.; Vrejoiu, I.

In: Nanotechnology, Vol. 22, No. 26, 265303, 01.07.2011.

Research output: Contribution to journalArticle

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