Fabrication and characterization of a microelectromechanical tunable capacitor

Ching Liang Dai, Shih Chieh Lin, Ming Wei Chang

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

A micromechanical tunable capacitor fabricated using the commercial 0.35 μm complementary metal oxide semiconductor (CMOS) process and the post-process has been investigated in this study. The structure of the tunable capacitor consists of a membrane, supported beams, driving and sensing electrodes. The membrane is sustained by the supported beams. The tunable capacitor requires only one wet etching post-process to release the suspended structures. The post-process has the advantages of easy execution and low cost. The tunable capacitor contains a driving part and a sensing part. The sensing part generates a change in capacitance when applying a driving voltage to the driving part. Experimental results show that the tunable capacitor has a capacitance of 1.38 pF, a tuning range of 85% and a Q-factor of 40 at 100 MHz.

LanguageEnglish
Pages1257-1262
Number of pages6
JournalMicroelectronics Journal
Volume38
Issue number12
DOIs
Publication statusPublished - 1 Dec 2007

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capacitors
Capacitors
Fabrication
fabrication
Capacitance
capacitance
membranes
Membranes
Wet etching
Q factors
CMOS
Tuning
Metals
tuning
etching
costs
Electrodes
electrodes
Electric potential
electric potential

Keywords

  • CMOS
  • Microactuator
  • Micromechanical tunable capacitor

Cite this

Dai, Ching Liang ; Lin, Shih Chieh ; Chang, Ming Wei. / Fabrication and characterization of a microelectromechanical tunable capacitor. In: Microelectronics Journal. 2007 ; Vol. 38, No. 12. pp. 1257-1262.
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Fabrication and characterization of a microelectromechanical tunable capacitor. / Dai, Ching Liang; Lin, Shih Chieh; Chang, Ming Wei.

In: Microelectronics Journal, Vol. 38, No. 12, 01.12.2007, p. 1257-1262.

Research output: Contribution to journalArticle

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