Etching characteristics of tin oxide thin films in argon-chlorine radio frequency plasmas

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	3010-3016
Journal	Journal of Vacuum Science and Technology A
Volume	14
Publication status	Published (in print/issue) - 1996

Cite this

@article{bb45f703234f4e46a91273fd7a86f95e,

title = "Etching characteristics of tin oxide thin films in argon-chlorine radio frequency plasmas",

author = "PD Maguire and J Molloy and SJ Laverty and JAD McLaughlin",

year = "1996",

language = "English",

volume = "14",

pages = "3010--3016",

journal = "Journal of Vacuum Science and Technology A",

publisher = "AVS Science and Technology Society",

}