Etching characteristics of tin oxide thin films in argon-chlorine radio frequency plasmas

PD Maguire, J Molloy, SJ Laverty, JAD McLaughlin

Research output: Contribution to journalArticle

9 Citations (Scopus)
Original languageEnglish
Pages (from-to)3010-3016
JournalJournal of Vacuum Science and Technology A
Volume14
Publication statusPublished - 1996

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