Etching characteristics of tin oxide thin films in argon-chlorine radio frequency plasmas

PD Maguire, J Molloy, SJ Laverty, JAD McLaughlin

Research output: Contribution to journalArticle

9 Citations (Scopus)
LanguageEnglish
Pages3010-3016
JournalJournal of Vacuum Science and Technology A
Volume14
Publication statusPublished - 1996

Cite this

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title = "Etching characteristics of tin oxide thin films in argon-chlorine radio frequency plasmas",
author = "PD Maguire and J Molloy and SJ Laverty and JAD McLaughlin",
year = "1996",
language = "English",
volume = "14",
pages = "3010--3016",
journal = "Journal of Vacuum Science and Technology A",
issn = "0734-2101",

}

Etching characteristics of tin oxide thin films in argon-chlorine radio frequency plasmas. / Maguire, PD; Molloy, J; Laverty, SJ; McLaughlin, JAD.

In: Journal of Vacuum Science and Technology A, Vol. 14, 1996, p. 3010-3016.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Etching characteristics of tin oxide thin films in argon-chlorine radio frequency plasmas

AU - Maguire, PD

AU - Molloy, J

AU - Laverty, SJ

AU - McLaughlin, JAD

PY - 1996

Y1 - 1996

M3 - Article

VL - 14

SP - 3010

EP - 3016

JO - Journal of Vacuum Science and Technology A

T2 - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

ER -