Enhanced and stable filed emission from in situ nitrogen-doped few-layered graphene nanoflakes

Navneet Soin, SS Roy, S Roy, KS Hazra, DS Misra, TH Lim, CJ Hetherington, JAD McLaughlin

Research output: Contribution to journalArticle

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Abstract

Vertically aligned few-layered graphene (FLG) nanoflakes were synthesized on bare silicon (Si) substrates by a microwave plasma enhanced chemical vapor deposition method. In situ nitrogen (N2) plasma treatment was carried out using electron cyclotron resonance plasma, resulting in various nitrogen functionalities being grafted to the FLG surface. Compared with pristine FLGs, the N2 plasma-treated FLGs showed significant improvement in field emission characteristics by lowering the turn-on field (defined at 10 μA/cm2) from 1.94 to 1.0 V/μm. Accordingly, the field emission current increased from 17 μA/cm2 at 2.16 V/μm for pristine FLGs to about 103 μA/cm2 at 1.45 V/μm for N-doped FLGs. Furthermore, N-doped FLG samples retained 94% of the starting current over a period of 10 000 s, during which the fluctuations were of the order of ±10.7% only. The field emission behavior of pristine and N2 plasma-treated FLGs is explained in terms of change in the effective microstructure as well as a reduction in the work function as probed by X-ray photoelectron valence band spectroscopy
LanguageEnglish
Pages5366-5372
JournalJournal of Physical Chemistry
Volume115
Issue number13
DOIs
Publication statusPublished - 2011

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graphene
nitrogen
field emission
electron cyclotron resonance
photoelectrons
vapor deposition
valence
microwaves
microstructure
silicon
spectroscopy
x rays

Cite this

Soin, Navneet ; Roy, SS ; Roy, S ; Hazra, KS ; Misra, DS ; Lim, TH ; Hetherington, CJ ; McLaughlin, JAD. / Enhanced and stable filed emission from in situ nitrogen-doped few-layered graphene nanoflakes. In: Journal of Physical Chemistry. 2011 ; Vol. 115, No. 13. pp. 5366-5372.
@article{9a959b19ef9f4ed691595ac5603a0089,
title = "Enhanced and stable filed emission from in situ nitrogen-doped few-layered graphene nanoflakes",
abstract = "Vertically aligned few-layered graphene (FLG) nanoflakes were synthesized on bare silicon (Si) substrates by a microwave plasma enhanced chemical vapor deposition method. In situ nitrogen (N2) plasma treatment was carried out using electron cyclotron resonance plasma, resulting in various nitrogen functionalities being grafted to the FLG surface. Compared with pristine FLGs, the N2 plasma-treated FLGs showed significant improvement in field emission characteristics by lowering the turn-on field (defined at 10 μA/cm2) from 1.94 to 1.0 V/μm. Accordingly, the field emission current increased from 17 μA/cm2 at 2.16 V/μm for pristine FLGs to about 103 μA/cm2 at 1.45 V/μm for N-doped FLGs. Furthermore, N-doped FLG samples retained 94{\%} of the starting current over a period of 10 000 s, during which the fluctuations were of the order of ±10.7{\%} only. The field emission behavior of pristine and N2 plasma-treated FLGs is explained in terms of change in the effective microstructure as well as a reduction in the work function as probed by X-ray photoelectron valence band spectroscopy",
author = "Navneet Soin and SS Roy and S Roy and KS Hazra and DS Misra and TH Lim and CJ Hetherington and JAD McLaughlin",
year = "2011",
doi = "10.1021/jp110476m",
language = "English",
volume = "115",
pages = "5366--5372",
journal = "Journal Of Physical Chemistry C",
issn = "1932-7447",
number = "13",

}

Enhanced and stable filed emission from in situ nitrogen-doped few-layered graphene nanoflakes. / Soin, Navneet; Roy, SS; Roy, S; Hazra, KS; Misra, DS; Lim, TH; Hetherington, CJ; McLaughlin, JAD.

In: Journal of Physical Chemistry, Vol. 115, No. 13, 2011, p. 5366-5372.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Enhanced and stable filed emission from in situ nitrogen-doped few-layered graphene nanoflakes

AU - Soin, Navneet

AU - Roy, SS

AU - Roy, S

AU - Hazra, KS

AU - Misra, DS

AU - Lim, TH

AU - Hetherington, CJ

AU - McLaughlin, JAD

PY - 2011

Y1 - 2011

N2 - Vertically aligned few-layered graphene (FLG) nanoflakes were synthesized on bare silicon (Si) substrates by a microwave plasma enhanced chemical vapor deposition method. In situ nitrogen (N2) plasma treatment was carried out using electron cyclotron resonance plasma, resulting in various nitrogen functionalities being grafted to the FLG surface. Compared with pristine FLGs, the N2 plasma-treated FLGs showed significant improvement in field emission characteristics by lowering the turn-on field (defined at 10 μA/cm2) from 1.94 to 1.0 V/μm. Accordingly, the field emission current increased from 17 μA/cm2 at 2.16 V/μm for pristine FLGs to about 103 μA/cm2 at 1.45 V/μm for N-doped FLGs. Furthermore, N-doped FLG samples retained 94% of the starting current over a period of 10 000 s, during which the fluctuations were of the order of ±10.7% only. The field emission behavior of pristine and N2 plasma-treated FLGs is explained in terms of change in the effective microstructure as well as a reduction in the work function as probed by X-ray photoelectron valence band spectroscopy

AB - Vertically aligned few-layered graphene (FLG) nanoflakes were synthesized on bare silicon (Si) substrates by a microwave plasma enhanced chemical vapor deposition method. In situ nitrogen (N2) plasma treatment was carried out using electron cyclotron resonance plasma, resulting in various nitrogen functionalities being grafted to the FLG surface. Compared with pristine FLGs, the N2 plasma-treated FLGs showed significant improvement in field emission characteristics by lowering the turn-on field (defined at 10 μA/cm2) from 1.94 to 1.0 V/μm. Accordingly, the field emission current increased from 17 μA/cm2 at 2.16 V/μm for pristine FLGs to about 103 μA/cm2 at 1.45 V/μm for N-doped FLGs. Furthermore, N-doped FLG samples retained 94% of the starting current over a period of 10 000 s, during which the fluctuations were of the order of ±10.7% only. The field emission behavior of pristine and N2 plasma-treated FLGs is explained in terms of change in the effective microstructure as well as a reduction in the work function as probed by X-ray photoelectron valence band spectroscopy

U2 - 10.1021/jp110476m

DO - 10.1021/jp110476m

M3 - Article

VL - 115

SP - 5366

EP - 5372

JO - Journal Of Physical Chemistry C

T2 - Journal Of Physical Chemistry C

JF - Journal Of Physical Chemistry C

SN - 1932-7447

IS - 13

ER -