Depth-sensitive analysis of a degraded tin oxide electrode surface in a plasma device application

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Abstract

The transparent conductive thin films used as electrodes for plasma device applications can be damaged by the background plasma with a resulting spectral alteration of the optical emission of the device, In this work, we studied the surface damage experienced by a plasma-based artificial nose by a combination of surface sensitive techniques. Atomic force microscopy and glancing incidence low, kV scanning electron microscopy show no change of microstructure. Energy dispersive X-ray analysis over a range of low electron energies reveals that the oxide has been reduced. This is confirmed by depth sensitive nanoindentation measurements, which indicate that the hardness and Young modulus are lower for the damaged surface. (C) 2001 Elsevier Science B.V. All rights reserved.
LanguageEnglish
Pages196-202
JournalThin Solid Films
Volume401
Issue number1-2
DOIs
Publication statusPublished - Dec 2001

Fingerprint

tin oxides
electrodes
nanoindentation
light emission
modulus of elasticity
hardness
incidence
atomic force microscopy
electron energy
damage
microstructure
scanning electron microscopy
oxides
thin films
x rays
energy

Keywords

  • atomic force microscopy
  • hardness
  • scanning electron microscopy
  • tin oxide

Cite this

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title = "Depth-sensitive analysis of a degraded tin oxide electrode surface in a plasma device application",
abstract = "The transparent conductive thin films used as electrodes for plasma device applications can be damaged by the background plasma with a resulting spectral alteration of the optical emission of the device, In this work, we studied the surface damage experienced by a plasma-based artificial nose by a combination of surface sensitive techniques. Atomic force microscopy and glancing incidence low, kV scanning electron microscopy show no change of microstructure. Energy dispersive X-ray analysis over a range of low electron energies reveals that the oxide has been reduced. This is confirmed by depth sensitive nanoindentation measurements, which indicate that the hardness and Young modulus are lower for the damaged surface. (C) 2001 Elsevier Science B.V. All rights reserved.",
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AU - Lemoine, P

AU - Mariotti, D

AU - Maguire, PD

AU - McLaughlin, JAD

PY - 2001/12

Y1 - 2001/12

N2 - The transparent conductive thin films used as electrodes for plasma device applications can be damaged by the background plasma with a resulting spectral alteration of the optical emission of the device, In this work, we studied the surface damage experienced by a plasma-based artificial nose by a combination of surface sensitive techniques. Atomic force microscopy and glancing incidence low, kV scanning electron microscopy show no change of microstructure. Energy dispersive X-ray analysis over a range of low electron energies reveals that the oxide has been reduced. This is confirmed by depth sensitive nanoindentation measurements, which indicate that the hardness and Young modulus are lower for the damaged surface. (C) 2001 Elsevier Science B.V. All rights reserved.

AB - The transparent conductive thin films used as electrodes for plasma device applications can be damaged by the background plasma with a resulting spectral alteration of the optical emission of the device, In this work, we studied the surface damage experienced by a plasma-based artificial nose by a combination of surface sensitive techniques. Atomic force microscopy and glancing incidence low, kV scanning electron microscopy show no change of microstructure. Energy dispersive X-ray analysis over a range of low electron energies reveals that the oxide has been reduced. This is confirmed by depth sensitive nanoindentation measurements, which indicate that the hardness and Young modulus are lower for the damaged surface. (C) 2001 Elsevier Science B.V. All rights reserved.

KW - atomic force microscopy

KW - hardness

KW - scanning electron microscopy

KW - tin oxide

U2 - 10.1016/S0040-6090(01)1606-6

DO - 10.1016/S0040-6090(01)1606-6

M3 - Article

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EP - 202

JO - Thin Solid Films

T2 - Thin Solid Films

JF - Thin Solid Films

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IS - 1-2

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