Abstract
Customized magnetic traps were developed to produce a domain of dense plasmas with a narrow ion beam directed to a particular area of the processed substrate. A planar magnetron coupled with an arc discharge source created the magnetic traps to confine the plasma electrons and generate the ion beam with the controlled ratio of ion-to-neutral fluxes. Images of the plasma jet patterns and numerical vizualizations help explaining the observed phenomena.
Original language | English |
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Pages (from-to) | 2518-2519 |
Journal | IEEE Transactions on Plasma Science |
Volume | 42 |
Publication status | Published (in print/issue) - 1 Oct 2014 |