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Dive into the research topics of 'Correlation of optical emission and ion flux with GaN etch rate in inductively coupled Ar/Cl2 plasma etching'. Together they form a unique fingerprint.- Sort by
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SA Rizvi, PD Maguire, CMO Mahony, OA Okpalugo, CS Corr, WG Graham, SM Morley
Research output: Contribution to journal › Article › peer-review