Controlled photochemical release of nitric oxide from O2-naphthylmethyl-and O2-naphthylallyl-substituted diazeniumdiolates

KM Bushan, H Xu, PH Ruane, RA D'Sa, CM Pavlos, JA Smith, TC Celius, JP Toscano

    Research output: Contribution to journalArticle

    18 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)12640-12641
    JournalJOURNAL OF THE AMERICAN CHEMICAL SOCIETY
    Volume124
    Issue number43
    Publication statusPublished - 2002

    Cite this

    Bushan, KM., Xu, H., Ruane, PH., D'Sa, RA., Pavlos, CM., Smith, JA., Celius, TC., & Toscano, JP. (2002). Controlled photochemical release of nitric oxide from O2-naphthylmethyl-and O2-naphthylallyl-substituted diazeniumdiolates. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 124(43), 12640-12641.