Controlled photochemical release of nitric oxide from O2-naphthylmethyl-and O2-naphthylallyl-substituted diazeniumdiolates

KM Bushan, H Xu, PH Ruane, RA D'Sa, CM Pavlos, JA Smith, TC Celius, JP Toscano

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	12640-12641
Journal	JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
Volume	124
Issue number	43
Publication status	Published (in print/issue) - 2002

Cite this

@article{3020e608e0d746b5ade6f871d80dfe47,

title = "Controlled photochemical release of nitric oxide from O2-naphthylmethyl-and O2-naphthylallyl-substituted diazeniumdiolates",

author = "KM Bushan and H Xu and PH Ruane and RA D'Sa and CM Pavlos and JA Smith and TC Celius and JP Toscano",

year = "2002",

language = "English",

volume = "124",

pages = "12640--12641",

journal = "JOURNAL OF THE AMERICAN CHEMICAL SOCIETY",

issn = "1520-5126",

publisher = "American Chemical Society",

number = "43",

}

TY - JOUR

T1 - Controlled photochemical release of nitric oxide from O2-naphthylmethyl-and O2-naphthylallyl-substituted diazeniumdiolates

AU - Bushan, KM

AU - Xu, H

AU - Ruane, PH

AU - D'Sa, RA

AU - Pavlos, CM

AU - Smith, JA

AU - Celius, TC

AU - Toscano, JP

PY - 2002

Y1 - 2002

M3 - Article

SN - 1520-5126

VL - 124

SP - 12640

EP - 12641

JO - JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

JF - JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

IS - 43

ER -