Control of calcium phosphate thin film stoichiometry using multi-target sputter deposition

Engineering & Materials Science

• Sputter deposition 100%
• Calcium phosphate 89%
• Stoichiometry 81%
• Thin films 57%
• Coatings 45%
• Crystallinity 24%
• Sputtering 17%
• Fourier transform infrared spectroscopy 16%
• X ray diffraction 13%
• In situ processing 11%
• Magnetron sputtering 9%
• Hydroxyapatite 8%
• Chemical analysis 8%
• X ray photoelectron spectroscopy 8%
• Crystalline materials 7%
• Surface properties 6%
• Annealing 6%
• Hot Temperature 3%

Chemistry

• Sputter Deposition 87%
• Calcium Phosphate 64%
• Reaction Stoichiometry 49%
• Coating Agent 36%
• Crystallinity 15%
• Phosphate 8%
• Magnetron Sputtering 7%
• Fourier Transform Infrared Spectroscopy 7%
• Deposition Technique 7%
• Sputtering 7%
• X-Ray Diffraction 6%
• Annealing 5%
• X-Ray Photoelectron Spectroscopy 4%
• Amorphous Material 4%
• Surface 4%

Physics & Astronomy

• calcium phosphates 83%
• stoichiometry 58%
• coatings 41%
• thin films 31%
• crystallinity 18%
• infrared spectroscopy 12%
• sputtering 10%
• x rays 9%
• diffraction 7%
• surface properties 6%
• magnetron sputtering 5%
• routes 5%
• photoelectron spectroscopy 5%
• requirements 4%
• augmentation 4%
• annealing 4%