Chemical bonding modifications of tetrahedral amorphous carbon and nitrogenated tetrahedral amorphous carbon films induced by rapid thermal annealing

R McCann, SS Roy, P Papakonstantinou, MF Bain, HS Gamble, JAD McLaughlin

Research output: Contribution to journalArticle

41 Citations (Scopus)

Abstract

Tetrahedral amorphous carbon (ta-C) and nitrogenated tetrahedral amorphous carbon films (ta-CNx), deposited by double bend off plane Filtered Vacuum Cathodic Arc were annealed up to 1000 degrees C in flowing argon for 2 min. Modifications on the chemical bonding structure of the rapidly annealed films, as a function of temperature, were investigated by NEXAFS, X-ray photoelectron and Raman spectroscopies. The interpretation of these spectra is discussed. The results demonstrate that the structure of undoped ta-C films prepared at floating potential with an arc current of 80 A remains stable up to 900 degrees C, whereas that of ta-CNx containing 12 at.% nitrogen is stable up to 700 degrees C. At higher temperatures, all the spectra indicated the predominant formation of graphitic carbon. Through NEXAFS studies, we clearly observed three pi* resonance peaks at the N K edge structure. The origin of these three peaks is not well established in the literature. However our temperature-dependant study ascertainedthat the first peak originates from C=N bonds and the third peak originates from the incorporation of nitrogen into the graphite like domains. (c) 2004 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)34-40
JournalThin Solid Films
Volume482
Issue number1-2
DOIs
Publication statusPublished - Jun 2005

Keywords

  • amorphous carbon films
  • carbon nitride
  • annealing
  • X-ray spectroscopy

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