Chemical bonding modifications of tetrahedral amorphous carbon and nitrogenated tetrahedral amorphous carbon films induced by rapid thermal annealing

R McCann, SS Roy, P Papakonstantinou, MF Bain, HS Gamble, JAD McLaughlin

Research output: Contribution to journalArticle

38 Citations (Scopus)

Abstract

Tetrahedral amorphous carbon (ta-C) and nitrogenated tetrahedral amorphous carbon films (ta-CNx), deposited by double bend off plane Filtered Vacuum Cathodic Arc were annealed up to 1000 degrees C in flowing argon for 2 min. Modifications on the chemical bonding structure of the rapidly annealed films, as a function of temperature, were investigated by NEXAFS, X-ray photoelectron and Raman spectroscopies. The interpretation of these spectra is discussed. The results demonstrate that the structure of undoped ta-C films prepared at floating potential with an arc current of 80 A remains stable up to 900 degrees C, whereas that of ta-CNx containing 12 at.% nitrogen is stable up to 700 degrees C. At higher temperatures, all the spectra indicated the predominant formation of graphitic carbon. Through NEXAFS studies, we clearly observed three pi* resonance peaks at the N K edge structure. The origin of these three peaks is not well established in the literature. However our temperature-dependant study ascertainedthat the first peak originates from C=N bonds and the third peak originates from the incorporation of nitrogen into the graphite like domains. (c) 2004 Elsevier B.V. All rights reserved.
LanguageEnglish
Pages34-40
JournalThin Solid Films
Volume482
Issue number1-2
DOIs
Publication statusPublished - Jun 2005

Fingerprint

Rapid thermal annealing
Carbon films
Amorphous carbon
Amorphous films
annealing
carbon
Nitrogen
Graphite
arcs
Argon
nitrogen
Temperature
Raman spectroscopy
Carbon
X ray photoelectron spectroscopy
Vacuum
floating
graphite
argon
photoelectron spectroscopy

Keywords

  • amorphous carbon films
  • carbon nitride
  • annealing
  • X-ray spectroscopy

Cite this

@article{6b548dbb78204b989e34971c6cc3e162,
title = "Chemical bonding modifications of tetrahedral amorphous carbon and nitrogenated tetrahedral amorphous carbon films induced by rapid thermal annealing",
abstract = "Tetrahedral amorphous carbon (ta-C) and nitrogenated tetrahedral amorphous carbon films (ta-CNx), deposited by double bend off plane Filtered Vacuum Cathodic Arc were annealed up to 1000 degrees C in flowing argon for 2 min. Modifications on the chemical bonding structure of the rapidly annealed films, as a function of temperature, were investigated by NEXAFS, X-ray photoelectron and Raman spectroscopies. The interpretation of these spectra is discussed. The results demonstrate that the structure of undoped ta-C films prepared at floating potential with an arc current of 80 A remains stable up to 900 degrees C, whereas that of ta-CNx containing 12 at.{\%} nitrogen is stable up to 700 degrees C. At higher temperatures, all the spectra indicated the predominant formation of graphitic carbon. Through NEXAFS studies, we clearly observed three pi* resonance peaks at the N K edge structure. The origin of these three peaks is not well established in the literature. However our temperature-dependant study ascertainedthat the first peak originates from C=N bonds and the third peak originates from the incorporation of nitrogen into the graphite like domains. (c) 2004 Elsevier B.V. All rights reserved.",
keywords = "amorphous carbon films, carbon nitride, annealing, X-ray spectroscopy",
author = "R McCann and SS Roy and P Papakonstantinou and MF Bain and HS Gamble and JAD McLaughlin",
note = "Symposium on Synthesis, Characterisation and Advanced Application of Amorphous Carbon Films, Strasbourg, FRANCE, MAY 24-28, 2004",
year = "2005",
month = "6",
doi = "10.1016/j.tsf.2004.11.151",
language = "English",
volume = "482",
pages = "34--40",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "1-2",

}

Chemical bonding modifications of tetrahedral amorphous carbon and nitrogenated tetrahedral amorphous carbon films induced by rapid thermal annealing. / McCann, R; Roy, SS; Papakonstantinou, P; Bain, MF; Gamble, HS; McLaughlin, JAD.

In: Thin Solid Films, Vol. 482, No. 1-2, 06.2005, p. 34-40.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Chemical bonding modifications of tetrahedral amorphous carbon and nitrogenated tetrahedral amorphous carbon films induced by rapid thermal annealing

AU - McCann, R

AU - Roy, SS

AU - Papakonstantinou, P

AU - Bain, MF

AU - Gamble, HS

AU - McLaughlin, JAD

N1 - Symposium on Synthesis, Characterisation and Advanced Application of Amorphous Carbon Films, Strasbourg, FRANCE, MAY 24-28, 2004

PY - 2005/6

Y1 - 2005/6

N2 - Tetrahedral amorphous carbon (ta-C) and nitrogenated tetrahedral amorphous carbon films (ta-CNx), deposited by double bend off plane Filtered Vacuum Cathodic Arc were annealed up to 1000 degrees C in flowing argon for 2 min. Modifications on the chemical bonding structure of the rapidly annealed films, as a function of temperature, were investigated by NEXAFS, X-ray photoelectron and Raman spectroscopies. The interpretation of these spectra is discussed. The results demonstrate that the structure of undoped ta-C films prepared at floating potential with an arc current of 80 A remains stable up to 900 degrees C, whereas that of ta-CNx containing 12 at.% nitrogen is stable up to 700 degrees C. At higher temperatures, all the spectra indicated the predominant formation of graphitic carbon. Through NEXAFS studies, we clearly observed three pi* resonance peaks at the N K edge structure. The origin of these three peaks is not well established in the literature. However our temperature-dependant study ascertainedthat the first peak originates from C=N bonds and the third peak originates from the incorporation of nitrogen into the graphite like domains. (c) 2004 Elsevier B.V. All rights reserved.

AB - Tetrahedral amorphous carbon (ta-C) and nitrogenated tetrahedral amorphous carbon films (ta-CNx), deposited by double bend off plane Filtered Vacuum Cathodic Arc were annealed up to 1000 degrees C in flowing argon for 2 min. Modifications on the chemical bonding structure of the rapidly annealed films, as a function of temperature, were investigated by NEXAFS, X-ray photoelectron and Raman spectroscopies. The interpretation of these spectra is discussed. The results demonstrate that the structure of undoped ta-C films prepared at floating potential with an arc current of 80 A remains stable up to 900 degrees C, whereas that of ta-CNx containing 12 at.% nitrogen is stable up to 700 degrees C. At higher temperatures, all the spectra indicated the predominant formation of graphitic carbon. Through NEXAFS studies, we clearly observed three pi* resonance peaks at the N K edge structure. The origin of these three peaks is not well established in the literature. However our temperature-dependant study ascertainedthat the first peak originates from C=N bonds and the third peak originates from the incorporation of nitrogen into the graphite like domains. (c) 2004 Elsevier B.V. All rights reserved.

KW - amorphous carbon films

KW - carbon nitride

KW - annealing

KW - X-ray spectroscopy

U2 - 10.1016/j.tsf.2004.11.151

DO - 10.1016/j.tsf.2004.11.151

M3 - Article

VL - 482

SP - 34

EP - 40

JO - Thin Solid Films

T2 - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 1-2

ER -