c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films

Antonia Terriza, Manuel Macias-Montero, Maria C. López-Santos, Francisco Yubero, José Cotrino, Agustín R. González-Elipe

    Research output: Contribution to journalArticle

    5 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)289-299
    JournalPlasma Processes and Polymers
    Volume11
    Issue number3
    DOIs
    Publication statusPublished - 2014

    Keywords

    • Plasmas
    • Fluorinated Carbon Films

    Cite this

    Terriza, A., Macias-Montero, M., López-Santos, M. C., Yubero, F., Cotrino, J., & González-Elipe, A. R. (2014). c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films. Plasma Processes and Polymers, 11(3), 289-299. https://doi.org/10.1002/ppap.201300129