c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films

Antonia Terriza, Manuel Macias-Montero, Maria C. López-Santos, Francisco Yubero, José Cotrino, Agustín R. González-Elipe

    Research output: Contribution to journalArticle

    5 Citations (Scopus)
    LanguageEnglish
    Pages289-299
    JournalPlasma Processes and Polymers
    Volume11
    Issue number3
    DOIs
    Publication statusPublished - 2014

    Keywords

    • Plasmas
    • Fluorinated Carbon Films

    Cite this

    Terriza, A., Macias-Montero, M., López-Santos, M. C., Yubero, F., Cotrino, J., & González-Elipe, A. R. (2014). c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films. Plasma Processes and Polymers, 11(3), 289-299. https://doi.org/10.1002/ppap.201300129
    Terriza, Antonia ; Macias-Montero, Manuel ; López-Santos, Maria C. ; Yubero, Francisco ; Cotrino, José ; González-Elipe, Agustín R. / c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films. In: Plasma Processes and Polymers. 2014 ; Vol. 11, No. 3. pp. 289-299.
    @article{dc33f2a33a1b47759cd8714fb586ee63,
    title = "c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films",
    keywords = "Plasmas, Fluorinated Carbon Films",
    author = "Antonia Terriza and Manuel Macias-Montero and L{\'o}pez-Santos, {Maria C.} and Francisco Yubero and Jos{\'e} Cotrino and Gonz{\'a}lez-Elipe, {Agust{\'i}n R.}",
    year = "2014",
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    language = "English",
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    journal = "Plasma Processes and Polymers",
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    Terriza, A, Macias-Montero, M, López-Santos, MC, Yubero, F, Cotrino, J & González-Elipe, AR 2014, 'c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films', Plasma Processes and Polymers, vol. 11, no. 3, pp. 289-299. https://doi.org/10.1002/ppap.201300129

    c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films. / Terriza, Antonia; Macias-Montero, Manuel; López-Santos, Maria C.; Yubero, Francisco; Cotrino, José; González-Elipe, Agustín R.

    In: Plasma Processes and Polymers, Vol. 11, No. 3, 2014, p. 289-299.

    Research output: Contribution to journalArticle

    TY - JOUR

    T1 - c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films

    AU - Terriza, Antonia

    AU - Macias-Montero, Manuel

    AU - López-Santos, Maria C.

    AU - Yubero, Francisco

    AU - Cotrino, José

    AU - González-Elipe, Agustín R.

    PY - 2014

    Y1 - 2014

    KW - Plasmas

    KW - Fluorinated Carbon Films

    U2 - 10.1002/ppap.201300129

    DO - 10.1002/ppap.201300129

    M3 - Article

    VL - 11

    SP - 289

    EP - 299

    JO - Plasma Processes and Polymers

    T2 - Plasma Processes and Polymers

    JF - Plasma Processes and Polymers

    SN - 1612-8850

    IS - 3

    ER -

    Terriza A, Macias-Montero M, López-Santos MC, Yubero F, Cotrino J, González-Elipe AR. c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films. Plasma Processes and Polymers. 2014;11(3):289-299. https://doi.org/10.1002/ppap.201300129