Abstract
Nitrogenated tetrahedral amorphous carbon (ta-C:N) films having nitrogen content from 0 to 10.3 at.%, have been produced by a double bend off-plane filtered cathodic vacuum arc system. X-ray photoelectron and Raman spectroscopies have been applied to study the effect of nitrogen in the bonding structure in the films. Deconvolution of the XPS spectra revealed a decrease in the amount of sp3-bonded carbon in the ta-C:N films. A comparative study between the Raman parameters at 514 and at 633 nm excitation wavelength was presented. Nitrogen (N) incorporation led to a lower G peak position and higher ID/IG ratios, indicating the development of larger sp2 domains. Q (−ve) parameter (which measures the skewness of G line) increased sharply with the increased of N content in the films. The hardness of the films was evaluated by nanoindentation.Copyright Elsevier 2004
Original language | English |
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Pages (from-to) | 1459-1463 |
Journal | Diamond and Related Materials |
Volume | 13 |
Issue number | 4-8 |
DOIs | |
Publication status | Published (in print/issue) - 2004 |
Keywords
- Amorphous carbon nitride
- XPS
- Raman
- Nanoindentation