Bonding configurations in DBOP-FCVA nitrogenated tetrahedral amorphous carbon films studied by Raman and X-ray photoelectron spectroscopies

SS Roy, P Papakonstantinou, GA Abbas, R McCann, JP Quinn, JAD McLaughlin

Research output: Contribution to journalArticle

28 Citations (Scopus)

Abstract

Nitrogenated tetrahedral amorphous carbon (ta-C:N) films having nitrogen content from 0 to 10.3 at.%, have been produced by a double bend off-plane filtered cathodic vacuum arc system. X-ray photoelectron and Raman spectroscopies have been applied to study the effect of nitrogen in the bonding structure in the films. Deconvolution of the XPS spectra revealed a decrease in the amount of sp3-bonded carbon in the ta-C:N films. A comparative study between the Raman parameters at 514 and at 633 nm excitation wavelength was presented. Nitrogen (N) incorporation led to a lower G peak position and higher ID/IG ratios, indicating the development of larger sp2 domains. Q (−ve) parameter (which measures the skewness of G line) increased sharply with the increased of N content in the films. The hardness of the films was evaluated by nanoindentation.Copyright Elsevier 2004
Original languageEnglish
Pages (from-to)1459-1463
JournalDiamond and Related Materials
Volume13
Issue number4-8
DOIs
Publication statusPublished - 2004

Keywords

  • Amorphous carbon nitride
  • XPS
  • Raman
  • Nanoindentation

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