Analysis of excitation processes and electron temperature changes from spectral data in a dc micro plasma discharge

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Abstract

A micro scale dc plasma discharge was studied to determine the potentialities for lab-on-the-chip applications. Different working conditions for the micro plasma discharge were considered: the pressure was varied between 2.7 and 5.3 kPa and the applied dc voltage was between 400 and 540 V, generating a discharge current in the range of 0.02–0.09 mA. The electrode distance was maintained at 0.025 cm and argon was used as the gas for the formation of plasma discharges. The number densities of excited states were determined by spectral emission data (400–1000 nm) and then were calculated by introducing a few assumptions: comparison of experimental and calculated number densities allowed an analysis of a volume averaged electron energy distribution function. Also, it was possible to estimate an effective electron temperature for different conditions of pressure and applied voltage.Copyright Institute of Physics 2004
LanguageEnglish
Pages576-581
JournalPlasma Sources Science and Technology
Volume13
Issue number4
DOIs
Publication statusPublished - 2004

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plasma jets
electron energy
excitation
spectral emission
electric potential
temperature
energy distribution
distribution functions
chips
argon
electrodes
estimates
gases

Cite this

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title = "Analysis of excitation processes and electron temperature changes from spectral data in a dc micro plasma discharge",
abstract = "A micro scale dc plasma discharge was studied to determine the potentialities for lab-on-the-chip applications. Different working conditions for the micro plasma discharge were considered: the pressure was varied between 2.7 and 5.3 kPa and the applied dc voltage was between 400 and 540 V, generating a discharge current in the range of 0.02–0.09 mA. The electrode distance was maintained at 0.025 cm and argon was used as the gas for the formation of plasma discharges. The number densities of excited states were determined by spectral emission data (400–1000 nm) and then were calculated by introducing a few assumptions: comparison of experimental and calculated number densities allowed an analysis of a volume averaged electron energy distribution function. Also, it was possible to estimate an effective electron temperature for different conditions of pressure and applied voltage.Copyright Institute of Physics 2004",
author = "D Mariotti and PD Maguire and CMO Mahony and JAD McLaughlin",
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TY - JOUR

T1 - Analysis of excitation processes and electron temperature changes from spectral data in a dc micro plasma discharge

AU - Mariotti, D

AU - Maguire, PD

AU - Mahony, CMO

AU - McLaughlin, JAD

PY - 2004

Y1 - 2004

N2 - A micro scale dc plasma discharge was studied to determine the potentialities for lab-on-the-chip applications. Different working conditions for the micro plasma discharge were considered: the pressure was varied between 2.7 and 5.3 kPa and the applied dc voltage was between 400 and 540 V, generating a discharge current in the range of 0.02–0.09 mA. The electrode distance was maintained at 0.025 cm and argon was used as the gas for the formation of plasma discharges. The number densities of excited states were determined by spectral emission data (400–1000 nm) and then were calculated by introducing a few assumptions: comparison of experimental and calculated number densities allowed an analysis of a volume averaged electron energy distribution function. Also, it was possible to estimate an effective electron temperature for different conditions of pressure and applied voltage.Copyright Institute of Physics 2004

AB - A micro scale dc plasma discharge was studied to determine the potentialities for lab-on-the-chip applications. Different working conditions for the micro plasma discharge were considered: the pressure was varied between 2.7 and 5.3 kPa and the applied dc voltage was between 400 and 540 V, generating a discharge current in the range of 0.02–0.09 mA. The electrode distance was maintained at 0.025 cm and argon was used as the gas for the formation of plasma discharges. The number densities of excited states were determined by spectral emission data (400–1000 nm) and then were calculated by introducing a few assumptions: comparison of experimental and calculated number densities allowed an analysis of a volume averaged electron energy distribution function. Also, it was possible to estimate an effective electron temperature for different conditions of pressure and applied voltage.Copyright Institute of Physics 2004

U2 - 10.1088/0963-0252/13/4/004

DO - 10.1088/0963-0252/13/4/004

M3 - Article

VL - 13

SP - 576

EP - 581

JO - Plasma Sources Science and Technology

T2 - Plasma Sources Science and Technology

JF - Plasma Sources Science and Technology

SN - 0963-0252

IS - 4

ER -