Acetylene–argon plasmas measured at an rf-biased substrate electrode for diamond-like carbon deposition: II. Ion energy distributions

A Baby, CMO Mahony, P Lemoine, PD Maguire

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Abstract

Ion energy distributions (IEDs) have been determined at the radio frequency (rf)-biasedelectrode in an inductively coupled acetylene–argon plasma for various substrate bias voltagesand frequencies under conditions suitable for diamond-like carbon (DLC) and polymer-likefilm deposition. These are compared with those obtained at a capacitively coupled plasmagrounded wall. In the former, for pressures
Original languageEnglish
JournalPlasma Sources Science and Technology
Volume20
Issue number015004
DOIs
Publication statusPublished - 7 Jan 2011

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