Acetylene–argon plasmas measured at an rf-biased substrate electrode for diamond-like carbon deposition: II. Ion energy distributions

A Baby, CMO Mahony, P Lemoine, PD Maguire

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Abstract

Ion energy distributions (IEDs) have been determined at the radio frequency (rf)-biasedelectrode in an inductively coupled acetylene–argon plasma for various substrate bias voltagesand frequencies under conditions suitable for diamond-like carbon (DLC) and polymer-likefilm deposition. These are compared with those obtained at a capacitively coupled plasmagrounded wall. In the former, for pressures
LanguageEnglish
JournalPlasma Sources Science and Technology
Volume20
Issue number015004
DOIs
Publication statusPublished - 7 Jan 2011

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argon plasma
acetylene
radio frequencies
energy distribution
diamonds
electrodes
carbon
polymers
ions

Cite this

@article{9bd0e349d9484674998e82bcbeb05081,
title = "Acetylene–argon plasmas measured at an rf-biased substrate electrode for diamond-like carbon deposition: II. Ion energy distributions",
abstract = "Ion energy distributions (IEDs) have been determined at the radio frequency (rf)-biasedelectrode in an inductively coupled acetylene–argon plasma for various substrate bias voltagesand frequencies under conditions suitable for diamond-like carbon (DLC) and polymer-likefilm deposition. These are compared with those obtained at a capacitively coupled plasmagrounded wall. In the former, for pressures",
author = "A Baby and CMO Mahony and P Lemoine and PD Maguire",
year = "2011",
month = "1",
day = "7",
doi = "10.1088/0963-0252/20/1/015004",
language = "English",
volume = "20",
journal = "Plasma Sources Science and Technology",
issn = "0963-0252",
number = "015004",

}

TY - JOUR

T1 - Acetylene–argon plasmas measured at an rf-biased substrate electrode for diamond-like carbon deposition: II. Ion energy distributions

AU - Baby, A

AU - Mahony, CMO

AU - Lemoine, P

AU - Maguire, PD

PY - 2011/1/7

Y1 - 2011/1/7

N2 - Ion energy distributions (IEDs) have been determined at the radio frequency (rf)-biasedelectrode in an inductively coupled acetylene–argon plasma for various substrate bias voltagesand frequencies under conditions suitable for diamond-like carbon (DLC) and polymer-likefilm deposition. These are compared with those obtained at a capacitively coupled plasmagrounded wall. In the former, for pressures

AB - Ion energy distributions (IEDs) have been determined at the radio frequency (rf)-biasedelectrode in an inductively coupled acetylene–argon plasma for various substrate bias voltagesand frequencies under conditions suitable for diamond-like carbon (DLC) and polymer-likefilm deposition. These are compared with those obtained at a capacitively coupled plasmagrounded wall. In the former, for pressures

U2 - 10.1088/0963-0252/20/1/015004

DO - 10.1088/0963-0252/20/1/015004

M3 - Article

VL - 20

JO - Plasma Sources Science and Technology

T2 - Plasma Sources Science and Technology

JF - Plasma Sources Science and Technology

SN - 0963-0252

IS - 015004

ER -