Acetylene–argon plasmas measured at an rf-biased substrate electrode for diamond-like carbon deposition: II. Ion energy distributions

A Baby; CMO Mahony; P Lemoine; PD Maguire

doi:10.1088/0963-0252/20/1/015004

Acetylene–argon plasmas measured at an rf-biased substrate electrode for diamond-like carbon deposition: II. Ion energy distributions

A Baby, CMO Mahony, P Lemoine, PD Maguire

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Abstract

Ion energy distributions (IEDs) have been determined at the radio frequency (rf)-biasedelectrode in an inductively coupled acetylene–argon plasma for various substrate bias voltagesand frequencies under conditions suitable for diamond-like carbon (DLC) and polymer-likefilm deposition. These are compared with those obtained at a capacitively coupled plasmagrounded wall. In the former, for pressures

Original language	English
Journal	Plasma Sources Science and Technology
Volume	20
Issue number	015004
DOIs	https://doi.org/10.1088/0963-0252/20/1/015004
Publication status	Published (in print/issue) - 7 Jan 2011

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10.1088/0963-0252/20/1/015004

0963-0252 20 1 015004Final published version, 1.47 MB

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title = "Acetylene–argon plasmas measured at an rf-biased substrate electrode for diamond-like carbon deposition: II. Ion energy distributions",

abstract = "Ion energy distributions (IEDs) have been determined at the radio frequency (rf)-biasedelectrode in an inductively coupled acetylene–argon plasma for various substrate bias voltagesand frequencies under conditions suitable for diamond-like carbon (DLC) and polymer-likefilm deposition. These are compared with those obtained at a capacitively coupled plasmagrounded wall. In the former, for pressures",

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T1 - Acetylene–argon plasmas measured at an rf-biased substrate electrode for diamond-like carbon deposition: II. Ion energy distributions

AU - Baby, A

AU - Mahony, CMO

AU - Lemoine, P

AU - Maguire, PD

PY - 2011/1/7

Y1 - 2011/1/7

N2 - Ion energy distributions (IEDs) have been determined at the radio frequency (rf)-biasedelectrode in an inductively coupled acetylene–argon plasma for various substrate bias voltagesand frequencies under conditions suitable for diamond-like carbon (DLC) and polymer-likefilm deposition. These are compared with those obtained at a capacitively coupled plasmagrounded wall. In the former, for pressures

AB - Ion energy distributions (IEDs) have been determined at the radio frequency (rf)-biasedelectrode in an inductively coupled acetylene–argon plasma for various substrate bias voltagesand frequencies under conditions suitable for diamond-like carbon (DLC) and polymer-likefilm deposition. These are compared with those obtained at a capacitively coupled plasmagrounded wall. In the former, for pressures

U2 - 10.1088/0963-0252/20/1/015004

DO - 10.1088/0963-0252/20/1/015004

M3 - Article

SN - 0963-0252

VL - 20

JO - Plasma Sources Science and Technology

JF - Plasma Sources Science and Technology

IS - 015004

ER -

Acetylene–argon plasmas measured at an rf-biased substrate electrode for diamond-like carbon deposition: II. Ion energy distributions

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