A microscopic Monte Carlo approach to modeling of Resistive Plate Chambers

We present a “microscopic” approach in modeling of Resistive Plate Chambers where individual electrons and their collisions with the gas molecules are followed using a Monte Carlo simulation technique. Timing resolutions and efficiencies are calculated for a specific timing RPC with 0.3 mm gas gap and gas mixture of 85% C2H2F4 + 5% iso-C4H10 + 10% SF6. Calculations are performed for different sets of cross sections for electron scattering in C2H2F4 and primary cluster size distributions. Results of calculations are compared with those obtained in experimental measurements. Electron avalanche fluctuations are also studied and compared with analytical models.